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The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films
Published online by Cambridge University Press: 25 February 2011
Abstract
Emission from CH and H radicals was monitored during the deposition of amorphous carbon films in a capacitively coupled rf glow discharge. Both the spectral and spatial distributions of the emission were studied. The relative intensity of the CH and H emission was found to be sensitive to changes in discharge parameters. Preliminary results indicate a correlation between the ratios of the CH to H emission intensities and the optical properties of the deposited films.
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- Research Article
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- Copyright © Materials Research Society 1987
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