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Requirements for TCO Substrate in Si-based Thin Film Solar Cells -Toward Tandem

Published online by Cambridge University Press:  01 February 2011

Takuji Oyama
Affiliation:
takuji-oyama@agc.co.jp, Asahi Glass Co., Ltd., Research Center, 1150 Hazawa-cho, Yokohama, N/A, Japan
Mika Kambe
Affiliation:
mika-kambe@agc.co.jp, Asahi Glass Co., Ltd., Research Center, Yokohama, 221-8755, Japan
Naoki Taneda
Affiliation:
naoki-taneda@agc.co.jp, Asahi Glass Co., Ltd., Research Center, Yokohama, 221-8755, Japan
Kunio Masumo
Affiliation:
kunio-masumo@agc.co.jp, Asahi Glass Co., Ltd., Research Center, Yokohama, 221-8755, Japan
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Abstract

Newly developed SnO2:F films having “double–texture (W-texture)” were evaluated in terms of optical and electrical properties and compared with Asahi type-U substrate. “W-textured” transparent conductive oxide (TCO) film was composed of a combination of 300-500nm large hills and small pyramidal texture covering them. “W-textured” TCO could show a large haze value exceeding 80% even at 800nm. Microcrystalline Si (μc-Si:H) thin film solar cells were fabricated on these TCOs and characterized. The result showed that a quantum efficiency of μc-Si:H solar cells was improved with “W-textured” TCOs significantly in longer wavelength region.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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