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Ruthenium Sputter Deposition on Organosilicate Glass and onParalyne: an XPS Study of Interfacial Chemistry, Nucleation andGrowth

Published online by Cambridge University Press:  17 March 2011

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Abstract

The interactions of sputter-deposited ruthenium with organosilicate glass(OSG) at 300 K have been studied by x-ray photoelectron spectroscopy (XPS)for Ru coverages from ∼ 0.1 monolayer to several monolayers, using in-situsample transfer between the deposition and analysis chambers. The resultsindicate Stranski-Krastanov (SK) type growth, with the completion of thefirst layer of Ru at an average thickness corresponding to 1 monolayeraverage coverage. Ru(0) is the only electronic state present. XPS core levelspectra indicate weak chemical interactions between Ru and the substrate. Aless pronounced tendency towards SK growth was observed for Ru deposition onparylene. Deposition of Ru on OSG followed by electroless deposition of Curesulted in the formation of a shiny copper film that failed the Scotch Tapetest. Results indicate failure mainly at the Ru/OSG interface.

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MRS Online Proceedings Library (OPL) , Volume 812: Symposium F – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2004 , 2004 , F2.5
Copyright
Copyright © Materials Research Society 2004

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