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Tie Importance of Contact Radius for Substrate-Independent Property Measurement of Thin Films

Published online by Cambridge University Press:  10 February 2011

J. L. Hay ,
M. E. O'Hern  and
W. C. Oliver
J. L. Hay
Affiliation:
Applied Nano Metrics, Inc. P.O. Box 26, Stormville, NY 12582, jandj.hay@worldnet.att.net
M. E. O'Hern
Affiliation:
Nano Instruments, Inc., 1001 Larson Drive, Oak Ridge, TN 37830, nano@nanoinst.com
W. C. Oliver
Affiliation:
Nano Instruments, Inc., 1001 Larson Drive, Oak Ridge, TN 37830, nano@nanoinst.com
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Abstract

In indentation literature, there is support for the proposition that the extents of the elastic and plastic fields scale with the contact radius. For example, in Hertzian contact, the locations of constant-shear-stress lines scale with the contact radius. This idea has significant consequences with respect to measuring substrate-independent properties of thin films. If it is the contact radius that determines the extent of the elastic and plastic fields, then any general rule expressed in terms of the indentation depth is only appropriate for one indenter geometry - the one for which it was determined. In this work, three different indenter geometries were used to measure the hardness of one thin film. For all geometries, hardness results are expressed in terms of both depth and contact radius

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 522: Symposium T – Fundamentals of Nanoindentation & Nanotribology , 1998 , 27
Copyright
Copyright © Materials Research Society 1998

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