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Topographic Kinetics and Practice of Low Angle Ion Beam Thinning

Published online by Cambridge University Press:  21 February 2011

Árpád Barna
Árpád Barna*
Affiliation:
Research Institute for Technical Physics of the Hungarian Academy Sciences, 1325 Budapest, Ujpest, POB 76. Hungary
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Abstract

The thinning technique is based on a simple geometrical model, describing the changes in the surface topography during ion beam etching. A high ion beam density makes jt possible that a thinning with an incidence angle of 0.5–7° ( measured from the sample surface) can take place within a reasonable time. Our method is applicable to a wide range of materials and to XTEM preparation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 254: Symposium W – Specimen Preparation for Transmission Electron Microscopy of Materials III , 1991 , 3
Copyright
Copyright © Materials Research Society 1992

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