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A Versatile Microwave Plasma Applicator

Published online by Cambridge University Press:  21 February 2011

Tian-Ren Ji  and
John E. Gerling
Tian-Ren Ji
Affiliation:
Guoguang Electron Tube Works, Chengdu, Peoples Republic of China
John E. Gerling
Affiliation:
Gerling Laboratories, 1628 Kansas Avenue, Modesto, CA
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Abstract

This paper describes a device used for the introduction of microwave energy into a plasma chamber over a wide area with high transfer efficiency and good energy uniformity.

The applicator design was based on a slotted waveguide combined with a quartz window. The impedance properties were calculated for slots in the broad wall of WR430 waveguide. Low power simulating tests were conducted to determine the optimum geometry. A simple test system was used to measure and plot the three-dimensional spatial energy distribution

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 124: Symposium M – Microwave Processing of Materials I , 1988 , 353
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

[1] Oliner, A.A., The Impedance Properties Of Narrow Radiating Slots In The Broad Face Of Rectangular Waveguide”, IRE Transactions on Antennas and Propagation January 1957, pp 4–20 Google Scholar
[2] Johnson, R.C. and Jasik, H., Antenna Engineering Handbook, 2nd Edition 1984, Chapter 9, Slot-Antenna Arrays, pp 9.1–9.37 Google Scholar
[3] Sayer, W. H. Jr., U.S. Patent No. 3 705 283 (December 1972)Google Scholar
[4] Blass, J. and Schall, L. H., U.S. Patent No. 2 704 802 (March 1955)Google Scholar