Hostname: page-component-7479d7b7d-q6k6v Total loading time: 0 Render date: 2024-07-12T19:35:10.340Z Has data issue: false hasContentIssue false

Wedge Tem Characterization of Movpe GaInAs/InP Layers, Concentration Grading at Interfaces

Published online by Cambridge University Press:  28 February 2011

R. Spycher
Affiliation:
Institut de Microscopie Electronique, Ecole Polytechnique Fédérale, CH-1015 LAUSANNE, Switzerland
P.A. Stadelmann
Affiliation:
Institut de Microscopie Electronique, Ecole Polytechnique Fédérale, CH-1015 LAUSANNE, Switzerland
P.A. Buffat
Affiliation:
Institut de Microscopie Electronique, Ecole Polytechnique Fédérale, CH-1015 LAUSANNE, Switzerland
Get access

Abstract

Wedge Transmission Electron Microscopy has many advantages, one of which is the concentration determination in III-V semiconductors with a fairly good accuracy. This allows us to determine the concentration variation during the growth of GaInAs/InP multilayered structures and to deduce the concentration grading at the interface GaInAs/InP (As in InP) and the abruptness of the InP/GaInAs interface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Kakibayashi, H. and Nagata, F., Jap. J. Appl. Phys. 25, 1644 (1986).Google Scholar
2. Jong, A.F. de and Janssen, K.T.F., J. Mat. Research 5, 578586 (1990).Google Scholar
3. Buffat, P.A., Ganiore, J.D. and Stadelmann, P., in Evaluation of Advanced Semiconductor Materials by Electron Microscoov, edited by Cherns, David (Plenum Publishing Corporation, 1990) pp. 319334.Google Scholar
4. Spycher, R. et al. , in Microsc. Semicond. Mater. Conf.. Oxford 1989 (Inst. Phys. Conf. Ser. 100, 1989) pp. 299304.Google Scholar
5. Stadelmann, P.A. and Buffat, P.A., in Computer Simulation of Electron Microscope Diffraction and Images, edited by Krakow, W. and O'Keefe, M. (The Minerals, Metals and Materials Society, 1989) pp. 159169.Google Scholar
6. Stadelmann, P.A., Ultramicroscopy 21, 131145 (1987).Google Scholar
7. Ganière, J.D. et al. , J. Microsc. Spectrosc. Electron. 14, 407414 (1989).Google Scholar
8. Radi, G., Acta Cryst. A26, 4156 (1970).Google Scholar
9. Bourret, A., Rouvière, J.L. and Spendeler, J., Phys. Stat. Sol. (a) 107, 481501 (1988).Google Scholar
10. Razeghi, M., in The MOCVD Challenge Vol. 1, edited by Hilsum, C (Adam Hilger, Bristol and Philadelphia, 1989) pp.38.Google Scholar