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Control of the substrate temperature using a triode magnetron sputtering system
Published online by Cambridge University Press: 30 November 2010
Abstract
The bombardment of ions and electrons at the substrate has been studied by varying the magnetic field distribution and the grid-target distance in a triode magnetron sputtering system. The substrate temperature was correlated with the substrate current density and with the type of species bombarding the substrate. The results indicate a possibility to modify and control the bombardment at the substrate surface from predominantly electronic to predominantly ionic, which increases the substrate temperature from 383 K to 473 K, respectively.
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- © EDP Sciences, 2010
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