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Effect of RF power on the structural and optical properties of RF-sputtered ZnO thin films

Published online by Cambridge University Press:  10 June 2014

Lahcen Nkhaili ,
Abdelkader El kissani ,
Mustapha Ait Ali ,
Youssef Ijdiyaou ,
Abdelmajid Elmansouri ,
Abdel-Ilah Elkhalfi  and
Abdelkader Outzourhit
Lahcen Nkhaili*
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Abdelkader El kissani
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Mustapha Ait Ali
Affiliation:
Laboratory of Coordination Chemistry and Catalysis, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Youssef Ijdiyaou
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Abdelmajid Elmansouri
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Abdel-Ilah Elkhalfi
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
Abdelkader Outzourhit
Affiliation:
Solid State Physics and Thin Films Laboratory, Faculty of Sciences Semlalia, Cadi Ayyad University, PO Box 2390, Marrakech 40000, Morocco
*
ae-mail: lahcen.com@hotmail.fr
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Abstract

ZnO thin films were deposited by reactive cathodic radio-frequency (RF) sputtering from a pure Zn target in a gas mixture of 30% O2 and 70% Ar and at different RF powers. The structural properties of the as-deposited thin films were studied by X-ray diffraction (XRD). The optical properties (especially the refractive index, absorption coefficient and optical band gap) were investigated by optical transmission measurements in the ultraviolet-visible-near Infrared wavelength range. The XRD patterns showed that the as-deposited ZnO thin films are polycrystalline. The crystallite size varied with RF power reaching a maximum at 200 W. These results were correlated with X-ray refectometry measurements which revealed a minimum in the film density at 200 W. The deposition rate of these films varied from 2.53 to 5.27 nm/min depending on the RF-power, with a maximum at 200 W. On the other hand, the optical band gap Eg was quasi-constant (about 3.28 eV) when the RF power was increased from 100 to 300 W.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 66 , Issue 3 , June 2014 , 30302
Copyright
© EDP Sciences, 2014

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