Hostname: page-component-77c89778f8-fv566 Total loading time: 0 Render date: 2024-07-17T04:34:38.878Z Has data issue: false hasContentIssue false

Plasma sterilization of Geobacillus Stearothermophilus by O2:N2 RF inductively coupled plasma

Published online by Cambridge University Press:  04 May 2006

O. Kylián
Affiliation:
European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Via E. Fermi 1, 21020 Ispra, Italy
T. Sasaki
Affiliation:
European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Via E. Fermi 1, 21020 Ispra, Italy
F. Rossi*
Affiliation:
European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Via E. Fermi 1, 21020 Ispra, Italy
Get access

Abstract

The aim of this work is to identify the main process responsible for sterilization of Geobacillus Stearothermophilus spores in O2:N2 RF inductively coupled plasma. In order to meet this objective the sterilization efficiencies of discharges in mixtures differing in the initial O2/N2 ratios are compared with plasma properties and with scanning electron microscopy images of treated spores. According to the obtained results it can be concluded that under our experimental conditions the time needed to reach complete sterilization is more related to O atom density than UV radiation intensity, i.e. complete sterilization is not related only to DNA damage as in UV sterilization but more likely to the etching of the spore.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

W.P. Menashi, US Patent 3 383 163 (1968)
Philip, N., Saoudi, B., Crevier, M.-C., Moisan, M., Barbeau, J., Pelletier, J., IEEE T. Plasma Sci. 20, 1429 (2002) CrossRef
Moreau, S., Moisan, M., Tabrizian, M., Barbeau, J., Pelletier, J., Ricard, A., L'H. Yahia, J. Appl. Phys. 88, 1166 (2000) CrossRef
Moisan, M., Barbeau, J., Crevier, M.-C., Pelletier, J., Philip, N., Saoudi, B., Pure Appl. Chem. 74, 349 (2002) CrossRef
Soloshenko, I.A., Tsiolko, V.V., Khomich, V.A., Schedrin, A.I., Ryabtsev, A.V., Bazhenov, V.Yu., Mikhno, I.L., Plasma Phys. Rep. 26, 845 (2000) CrossRef
Feichtinger, J., Shultz, A., Walker, M., Schumacher, U., Surf. Coat. Tech. 174–175, 564 (2003) CrossRef
Lerouge, S., Wertheimer, M.R., Marchand, R., Tabrizian, M., L'H. Yahia, J. Biomed. Mater. Res. 51, 128 (2000) 3.0.CO;2-#>CrossRef
Nagatsu, M., Terashita, F., Nonaka, H., Xiu, L., Nagata, T., Koide, Y., Appl. Phys. Lett. 86, 128 (2005) CrossRef
Lerouge, S., Wertheimer, M.R., L'H. Yahia, Plasmas Polymers 6, 175 (2001) CrossRef
P. Colpo, F. Rossi, International patent US 6 649 223 (2001)
Coburn, J.W., Chen, M.J., J. Appl. Phys. 51, 3134 (1980) CrossRef