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XPS and cathodoluminescence studies of HfO2, Sc2O3 and (HfO2)1-x(Sc2O3)x films

Published online by Cambridge University Press:  25 October 2013

Vasily V. Kaichev*
Affiliation:
Boreskov Institute of Catalysis, Lavrentiev ave. 5, 630090 Novosibirsk, Russian Federation
Ekaterina V. Ivanova
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya st. 26, 194021 Saint Petersburg, Russian Federation
Maria V. Zamoryanskaya
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya st. 26, 194021 Saint Petersburg, Russian Federation
Tamara P. Smirnova
Affiliation:
Nikolaev Institute of Inorganic Chemistry, Lavrentiev ave. 3, 630090 Novosibirsk, Russian Federation
Lubov V. Yakovkina
Affiliation:
Nikolaev Institute of Inorganic Chemistry, Lavrentiev ave. 3, 630090 Novosibirsk, Russian Federation
Vladimir A. Gritsenko
Affiliation:
Rzhanov Institute of Semiconductor Physics, Lavrentiev ave. 13, 630090 Novosibirsk, Russian Federation
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Abstract

X-ray photoelectron spectroscopy (XPS) and cathodoluminescence (CL) method have been employed to study the chemical composition and the oxygen vacancy concentration of HfO2, Sc2 O3 and (HfO2)1−x(Sc2O3)x films. It was found that the increase of Sc content led to monotonic decreasing the Hf4f7/2 and Sc2p3/2 binding energies indicating to form solid solution (HfO2)1−x(Sc2O3)x. All the samples characterized by the intensive CL spectra with maximum around 3 eV which originated due to some radiative recombination emission caused by oxygen deficiency. The concentration of oxygen vacancy in the Sc-doped HfO2 is sensitive to the Sc content and as a result the intensity of CL spectra of (HfO2)1−x(Sc2O3)x is lower that those of pure HfO2 and Sc2O3.

Type
Research Article
Copyright
© EDP Sciences, 2013

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References

Gusev, E.P., Cartier, E., Buchanan, D.A., Gribelyuk, M., Copel, M., Okorn-Schmidt, H., D’Emic, C., Microelectron. Eng. 59, 341 (2001)CrossRef
Adelman, C., Sriramkumar, V., van Elshocht, S., Lehnen, P., Conard, T., De Gendt, S., Appl. Phys. Lett. 91, 162902 (2007)CrossRef
Cartier, E., Linder, B.P., Narayanan, V., Paruchuri, V.K., Tech. Dig. - Int. Electron Devices Meet. 57 (2006)
Gavartin, J.L., Ramo, D.M., Shluger, A.L., Bersuker, G., Lee, H., Appl. Phys. Lett. 89, 082908 (2006)CrossRef
Liu, D., Robertson, J., Appl. Phys. Lett. 94, 042904 (2009)CrossRef
Yu, H.Y., Li, M.F., Cho, B.J., Yeo, C.C., Joo, M.S., Kwong, D.-L., Pan, J.S., Ang, C.H., Zheng, J.Z., Ramanathan, S., Appl. Phys. Lett. 81, 376 (2002)CrossRef
Afanas’ev, V.V., Stesmans, A., Tsai, W., Appl. Phys. Lett. 82, 245 (2003)CrossRef
Yu, H.Y., Li, M.F., Kwong, D.L., Thin Solid Films 462–463, 110 (2004)CrossRef
Zhu, J., Liu, Z.G., Appl. Phys. A 80, 1769 (2005)CrossRef
Bundesmann, C., Buiu, O., Hall, S., Schubert, M., Appl. Phys. Lett. 91, 121916 (2007)CrossRef
Smirnova, T.P., Lebedev, M.S., Morozova, N.B., Semyannikov, P.P., Zherikova, K.V., Kaichev, V.V., Dubinin, Y.V., Chem. Vapor Depos. 16, 185 (2010)CrossRef
Kaichev, V.V., Dubinin, Y.V., Smirnova, T.P., Lebedev, M.S., J. Struct. Chem. 52, 480 (2011)CrossRef
Scofield, J.H., J. Electron Spectros. Relat. Phenomena 8, 129 (1976)CrossRef
Zamoryanskaya, M.V., Konnikov, S.G., Zamoryanskii, A.N., Instrum. Exp. Tech. 47, 477 (2004)CrossRef
Smirnova, T.P., Kaichev, V.V., Yakovkina, L.V., Kosyakov, V.I., Beloshapkin, S.A., Kuznetsov, F.A., Lebedev, M.S., Gritsenko, V.A., Inorganic Mater. 44, 965 (2008)CrossRef
Moon, T.-H., Ham, M.-H., Kim, M.-S., Yun, I., Myoung, J.-M., Appl. Surf. Sci. 240, 105 (2005)CrossRef
Fang, Q., Zhang, J.-Y., Wang, Z., Modreanu, M., O’Sullivan, B.J., Hurley, P.K., Leedham, T.L., Hywel, D., Audier, M.A., Jimenez, C., Senateur, J.-P., Boyd, I.W., Thin Solid Films 453–454, 203 (2004)CrossRef
Cho, M.-H., Roh, Y.S., Whang, C.N., Jeong, K., Nahm, S.W., Ko, D.-H., Lee, J.H., Fujihara, K., Appl. Phys. Lett. 81, 472 (2002)CrossRef
Renault, O., Samour, D., Damlencourt, J.-F., Blin, D., Martin, F., Marthon, S., Barrett, N.T., Besson, P., Appl. Phys. Lett. 81, 3627 (2002)CrossRef
Kim, K.S., Winograd, N., Chem. Phys. Lett. 31, 312 (1975)CrossRef
Grosso, D., Sermon, P.A., Thin Solid Films 368, 116 (2000)CrossRef
Teterin, Y.A., Teterin, A.Y., Russ. Chem. Rev. 71, 347 (2002)CrossRef
van der Heide, P.A.W., J. Electron Spectros. Relat. Phenomena 151, 79 (2006)CrossRef
Walsh, S., Fang, L., Schaeffer, J.K., Weisbrod, E., Brillson, L.J., Appl. Phys. Lett. 90, 052901 (2007)CrossRef
Afanas’ev, V.V., Stesmans, A., Chen, F., Shi, X., Campbell, S.A., Appl. Phys. Lett. 81, 1053 (2002)CrossRef
Kato, H., Nango, T., Miyagawa, T., Katagiri, T., Seol, K.S., Ohki, Y., J. Appl. Phys. 92, 1106 (2002)CrossRef
Chueh, Y.-L., Chou, L.-J., Wang, Z.L., Angew. Chem. Int. Ed. 45, 7773 (2006)CrossRef
Foster, A.S., Gejo, F.L., Shluger, A.L., Nieminen, R.M., Phys. Rev. B 65, 174117 (2002)CrossRef
Ito, T., Maeda, M., Nakamura, K., Kato, H., Ohki, Y., J. Appl. Phys. 97, 054104 (2005)CrossRef
Ito, T., Kato, H., Ohki, Y., J. Appl. Phys. 99, 094106 (2006)CrossRef
Rastorguev, A.A., Belyi, V.I., Smirnova, T.P., Zamoryanskaya, M.V., Yakovkina, L.V., Gritsenko, V.A., Wong, H., Phys. Rev. B 76, 235315 (2007)CrossRef