Scanning Probe Microscopy (SPM), in particular Atomic Force Microscopy (AFM), has become well establish member of the IC metrology tool arsenal which few IC manufacturers are without. Although Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) remain the “workhorse” metrology techniques, SPM (standard AFM, as well as Scanning Capacitance Microscopy (SCM), Scanning Spreading Resistance Microscopy (SSRM), Scanning Kelvin probe, Nanoindentaion and others) are being increasingly called upon to help solve IC production problems and to aid in research and development for next generation devices.

Topographical metrology with standard AFM is by far the most common application of SPM in the semiconductor industry. It is typically used to gain surface roughness and grain size information about thin films that can be used as feedback to modify deposition conditions until the desired film properties are obtained.