Skip to main content Accessibility help
×
Hostname: page-component-7479d7b7d-m9pkr Total loading time: 0 Render date: 2024-07-09T11:51:58.529Z Has data issue: false hasContentIssue false

1 - Shallow impurities

Published online by Cambridge University Press:  05 October 2010

E. F. Schubert
Affiliation:
AT&T Bell Laboratories, New Jersey
Get access

Summary

Shallow impurities are of great technological importance in semiconductors since they determine the conductivity and the carrier type of the semiconductor. Shallow impurities are defined as impurities which are ionized at room temperature. This condition limits the ionization energy of such impurities to values « 100 meV. Shallow impurities can be either acceptors or donors, i.e. ‘accept’ electrons from the valence band or ‘donate’ electrons to the conduction band.

The hydrogen atom model can serve as the basis for the calculation of many properties of shallow impurities such as ionization energy and state wave functions. In this chapter, the hydrogen atom is analyzed in terms of Bohr's semi-classical model and in terms of a quantum mechanical approach. The hydrogen atom model is then applied to shallow impurities. Properties such as ionization energies, wave functions, central cell correction terms, and screening of impurity potentials by free carriers are summarized. Effects associated with high impurity or high free carrier concentrations are also discussed including the Mott transition, the Burstein–Moss shift, band tails, impurity bands, and bandgap shrinkage.

Hydrogenic impurities

Impurities in semiconductors can be incorporated on substitutional sites, interstitial sites, or as impurity complexes. Here, we restrict ourselves to substitutional, shallow impurities. Examples for such impurities are Be, Zn, Si, and Sn. These impurities are shallow, i.e. their ionization energy is comparable to the thermal energy kT at room temperature.

Type
Chapter
Information
Publisher: Cambridge University Press
Print publication year: 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Save book to Kindle

To save this book to your Kindle, first ensure coreplatform@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

  • Shallow impurities
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.004
Available formats
×

Save book to Dropbox

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Dropbox.

  • Shallow impurities
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.004
Available formats
×

Save book to Google Drive

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Google Drive.

  • Shallow impurities
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.004
Available formats
×