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17 - Submonolayer deposition

Published online by Cambridge University Press:  23 December 2009

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Summary

The main focus of our previous discussion of MBE has been the identification of various universality classes. The models we discussed are expected to be valid on a coarse-grained level, at which the exact structure and form of an island does not matter. However, with the perfection of experimental tools, it is possible to observe the interface morphology at the atomic scale – leading to the discovery of rich island morphologies. In this chapter we focus on this early-time morphology, for which the coverage is less than one monolayer; this regime is usually referred to as submonolayer epitaxy.

The phenomenology is quite simple. Start with a flat interface, and deposit atoms with a constant flux. The deposited atoms diffuse on the surface until they meet another atom or the edge of an island, whereupon they stick. Thus if at a given moment we would photograph the surface, we would observe a number of clusters – called islands – with monomers diffusing between them. What is the typical size and number of the islands? What is their morphology? How do these quantities change with the coverage and with the flux? These are among the questions we address.

Model

Let us consider in more detail the deposition process outlined above. Consider a perfectly flat crystal surface with no atoms on it. At time zero we begin to deposit atoms with a constant flux F. Atoms arrive on the surface and diffuse (the deposition and diffusion processes take place simultaneously).

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Publisher: Cambridge University Press
Print publication year: 1995

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