Book contents
- Frontmatter
- Contents
- Preface
- Chapter 1 Introduction to surface processes
- Chapter 2 Surfaces in vacuum: ultra-high vacuum techniques and processes
- Chapter 3 Electron-based techniques for examining surface and thin film processes
- Chapter 4 Surface processes in adsorption
- Chapter 5 Surface processes in epitaxial growth
- Chapter 6 Electronic structure and emission processes at metallic surfaces
- Chapter 7 Semiconductor surfaces and interfaces
- Chapter 8 Surface processes in thin film devices
- Chapter 9 Postscript – where do we go from here?
- Appendix A Bibliography
- Appendix B List of acronyms
- Appendix C Units and conversion factors
- Appendix D Resources on the web or CD-ROM
- Appendix E Useful thermodynamic relationships
- Appendix F Conductances and pumping speeds, C and S
- Appendix G Materials for use in ultra-high vacuum
- Appendix H UHV component cleaning procedures
- Appendix J An outline of local density methods
- Appendix K An outline of tight binding models
- References
- Index
Appendix B - List of acronyms
Published online by Cambridge University Press: 06 July 2010
- Frontmatter
- Contents
- Preface
- Chapter 1 Introduction to surface processes
- Chapter 2 Surfaces in vacuum: ultra-high vacuum techniques and processes
- Chapter 3 Electron-based techniques for examining surface and thin film processes
- Chapter 4 Surface processes in adsorption
- Chapter 5 Surface processes in epitaxial growth
- Chapter 6 Electronic structure and emission processes at metallic surfaces
- Chapter 7 Semiconductor surfaces and interfaces
- Chapter 8 Surface processes in thin film devices
- Chapter 9 Postscript – where do we go from here?
- Appendix A Bibliography
- Appendix B List of acronyms
- Appendix C Units and conversion factors
- Appendix D Resources on the web or CD-ROM
- Appendix E Useful thermodynamic relationships
- Appendix F Conductances and pumping speeds, C and S
- Appendix G Materials for use in ultra-high vacuum
- Appendix H UHV component cleaning procedures
- Appendix J An outline of local density methods
- Appendix K An outline of tight binding models
- References
- Index
Summary
The following list gives the names of the acronyms used; the sections where they are first or most relevantly introduced are given in brackets.
0D, 1D, 2D, 3D: Zero, one, two or three (dimensions or dimensional) [throughout] as in 2DEG: two dimensional electron gas [8.2.3]
AES: Auger electron spectroscopy [3.3, 3.4]
AFM: atomic force microscopy [3.1.3]
ALE: atomic layer epitaxy [1.4.4]
APCVD: atmospheric pressure CVD [2.5.5]
APW: augmented plane waves (band structure method) [6.1.2]
AR: angular resolved, as in ARUPS [3.3.1]
BCF: Burton, Cabrera & Frank (see reference list for this 1951 paper) [1.3.2, 5.5.1]
BEEM, BEES: ballistic energy emission microscopy, spectroscopy [8.1.3]
CBED, CBIM: convergent beam electron diffraction [3.1.4, 8.1.3], imaging [8.1.3]
CERN: Centre Européenne pour la Recherche Nucléaire (accelerator laboratory) [2.1.3]
CFE: cold field emisison [6.2.3]
C–I: commensurate–incommensurate (phase or transition) [4.4.2]
CAP, CIP, and CPP: Current at an Angle, In or Perpendicular to the Plane [8.3.3]
CMOS: complementary metal–oxide–semiconductor (device) [8.1, 9.1]
C–V: current–voltage, as in C–V profiling [8.2.3]
CVD: chemical vapor deposition [2.5.5]
DAS: dimer–adatom–stacking fault model [1.4.5, 7.2.3]
DFT: density functional theory [4.5.2, 6.1.2, Appendix J]
DLC: diamond-like carbon [6.2.2, 8.4.3]
DLEED: diffuse LEED [3.2.2]
DLTS: deep level transient spectroscopy [8.1.3]
DNA: deoxyribo-nucleic acid [8.4.4]
EAM: embedded atom model [4.5.2, 6.1.2]
EELS: electron energy loss spectroscopy [3.3.1]
EMT: effective medium theory [4.5.2, 6.1.2]
ES: the Ehrlich–Schwoebel barrier [5.5.1]
ESCA: electron spectroscopy for chemical analysis [3.3.1]
ESR: electron spin resonance [8.1.3]
FEM, FES: field emission microscopy, spectroscopy [6.2.3]
FET: field effect transistor [8.4.2]
FIM: field ion microscopy [3.1.3, 5.4.2] …
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- Information
- Introduction to Surface and Thin Film Processes , pp. 306 - 308Publisher: Cambridge University PressPrint publication year: 2000