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Light Element Analysis Using Txrf

Published online by Cambridge University Press:  06 March 2019

T. Fukuda ,
T. Shoji ,
M. Funabashi ,
T. Utaka ,
T. Arai ,
K. Miyazaki ,
A. Shimazaki  and
R. Wilson
T. Fukuda
Affiliation:
Rigaku Industrial Corporation, Osaka, Japan
T. Shoji
Affiliation:
Rigaku Industrial Corporation, Osaka, Japan
M. Funabashi
Affiliation:
Rigaku Industrial Corporation, Osaka, Japan
T. Utaka
Affiliation:
Rigaku Industrial Corporation, Osaka, Japan
T. Arai
Affiliation:
Rigaku Industrial Corporation, Osaka, Japan
K. Miyazaki
Affiliation:
Toshiba Corporation, Kanagawa, Japan
A. Shimazaki
Affiliation:
Toshiba Corporation, Kanagawa, Japan
R. Wilson
Affiliation:
Toshiba Corporation, Kanagawa, Japan Rigaku / USA, Inc., Danvers, Massachusetts
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Extract

Over the past few years there has been substantial progress in the TXRF analysis of heavy element surface contamination on silicon wafers. Further advances and improvements are desired in the analytical performance and hardware. Extension of the analytical range to include the light elements is particularly desirable.

In the case of light element analysis, sodium and aluminum impurities have been monitored in the IC production process. The increase of the sodium impurity in a silicon wafer gives rise to a decrease in the insulation in IC devices and the growth of the SiO2 film is disturbed by the prsence of aluminum impurity on the silicon wafer surface.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 781 - 790
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

1 Fukunda, T., Shoji, T., Funahashi, M., Utaka, T., Miyazaski, K. and Shimazaki, A.; The 30th meeting in Tukuba of the Discussion Group of X-ray Analysis in Japan Society for Analytical Chemistry (1994) in Japanese.Google Scholar
2 Streli, C., Wobrauscher, P. and Aiginger, H., Spectochimica Acta vol. 44B No. 5 (1989) 491-497, ibid. vol. 46B No. 10(1991) 1351 ∼ 1359 and ibid. vol. 48 B No. 2 (1993) 163 – 170Google Scholar
3 Streli, C., Worausclier, P. and Aiginger, H., Ladrsich, W. and Rieder, R.; Advances in X-ray Analysis vol. 37 (1994) 557 – 583Google Scholar
4 Freitag, K., Reus, U. and Fleischauer, J., Spectrochimica Acta. vol. 44B No. 5 (1989) 499– 504 Google Scholar