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X-Ray Diffraction from Multilayers with Different Microstructures

Published online by Cambridge University Press:  06 March 2019

Ping He ,
John A. Woolkm  and
Federico O. Sequeda
Ping He
Affiliation:
Center for Microelectronic and Optical Materials Research, University of Nebraska, Lincoln, NE 68588-0511
John A. Woolkm
Affiliation:
Center for Microelectronic and Optical Materials Research, University of Nebraska, Lincoln, NE 68588-0511
Federico O. Sequeda
Affiliation:
IBM Corporation, Rochester, MN 55901
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Abstract

X-ray diffraction measurements were performed on CoαPt1-α/Pd, Co/Pd, Co/Fe, and Co/W multilayer samples with different structures, such as CoαPt1-α alloy layer composition α, bilayer thickness, and number of bilayers. Multilayer samples were made by magnetron sputtering in a chamber with multi-parallel guns and a position controllable substrate. CoαPt1-α alloy layers were deposited by cosputtering from Co and Pt targets mounted on guns tilted towards a common substrate. Compositions of Co and Pt in CoαPt1-α layers were varied by use of different sputtering power. The thicknesses of magnetic and non-magnetic layers in multilayered samples were also systematically changed to investigate the relationship between x-ray diffraction lines and crystalline structures of multilayered films. It was found that the position of the main diffraction peak from multilayered films was solely determined by the crystalline structures within bilayers rather than bilayer thickness. A model was introduced to calculate microstructural parameters such as the thickness of interfaces and compositions at interfaces.

Type
V. X-Ray Characterization of Thin Films
Information
Advances in X-Ray Analysis , Volume 36: Forty-First Annual Conference on Applications of X-ray Analysis, August 3-7, 1992 , 1992 , pp. 185 - 196
Copyright
Copyright © International Centre for Diffraction Data 1992

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