Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-18T01:28:55.637Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of Thin by X-Ray Fluorescence and Diffraction Analysis

Published online by Cambridge University Press:  06 March 2019

T. C. Huang  and
W. Parrish
T. C. Huang
Affiliation:
IBM Research Laboratory, 5600 Cottle Road San Jose, California 95193
W. Parrish
Affiliation:
IBM Research Laboratory, 5600 Cottle Road San Jose, California 95193
Get access

Abstract

This paper presents a comprehensive study of various applications of x-ray fluorescence and diffraction techniques for the characterization of thin films. With the proper use of x-ray instruments and techniques, a fairly complete understanding of the chemical and physical structure of thin films was obtained. The x-ray fluorescence (XRF) method was used for the determination of composition, mass-thickness, and density. The x-ray diffraction (XRD) method was used for structural characterization, including: local atomic arrangements of amorphous materials; phase identification, preferred orientation, crystallite size, stacking faults, microstrain, the annealing behaviors of polycrystalline films; and lattice mismatch between the epitaxial film and its single-crystal substrate.

In order to obtain a clear picture of the capabilities of the x-ray method and the properties of thin films, a series of carefully selected specimens representing a wide range of compositions and thicknesses was used. A number of practical x-ray techniques, which are valuable for this type of analysis, are also introduced.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 22: Twenty-Seventh Annual Conference on Applications of X-ray Analysis, August 1-4, 1978 , 1978 , pp. 43 - 63
Copyright
Copyright © International Centre for Diffraction Data 1978

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Laguitton, D. and Mantler, M., “A General Fortran Program for Quantitative X-Ray Fluorescence Analysis,” in McMurdie, H. F., Barrett, C. S., Newkirk, J. B. and Ruud, C. O., Editors, Advances in X-Ray Analysis, Vol, 20, p. 515–528, Plenum Press (1977).Google Scholar
2. Laguitton, D. and Parrish, W., “Simultaneous Determination of Composition and Mass-Thickness of Thin Films by Quantitative X-Ray Fluorescence Analysis,” Anal. Chem. 49 1152–1156 (1977).Google Scholar
3. Criss, J. W. and Birks, L. S., “Calculation Methods for Fluorescent X-Ray Spectrometry. Empirical Coefficients vs. Fundamental Parameters,” Anal. Chem, 40, 1080–1086 (1968).Google Scholar
4. Sherman, J., “The Theoretical Derivation of X-Ray Intensities from Mixtures,” Spectrom. Acta 7, 283–306 (1955).Google Scholar
5. Pollai, G., Mantler, M. and Ebel, H., “Die Sekundaranregung bei der Rontgenfluoreszenzanalyse ebener dunner Schichten,” Spectrom. Acta 26B , 747–759 (1971).Google Scholar
6. Wagner, C. N. J., “A Fortran IV Program for the Calculation of the Radial Distribution Function of Binary Alloys,” Technical Report No. 2, NSF GP 3213.Google Scholar
7. Wagner, C. N. J., Heiman, N., T. C. Huang, , Onton, A. and Parrish, W., “The Structure of Amorphous Gd-Co Alloy Films,” in Becker, J. J., Lander, G. H. and Rhyne, J. J., Editors, Magnetism and Magnetic Materials. AIP Conf, Proc, No. 29, p. 188–189, Am. Inst, of Physics (1975).Google Scholar
8. Giessen, B. C. and Wagner, C. N. J., “Structure and Properties of Non-Crystalline Metallic Alloys Produced by Rapid Quenching,” in Beer, S. Z., Editor, Liquid Metals, Chemistry and Physics, p. 633–695, Marcel Dekker (1972).Google Scholar
9. Elliot, R. P., “Constitution of Binary Alloys,” First Suppl., p. 870, McGraw-Hill (1965).Google Scholar
10. Cargill III, G. S., “Structure of Metallic Alloy Glasses,” In Seitz, F., Turnbull, D. and Ehrenreich, H., Editors, Solid State Physics, Vol. 30, p. 295–318, Academic Press (1975).Google Scholar
11. Parrish, W., “X-Ray Diffractometry Methods for Complex Powder Patterns,” In van Olphen, H. and Parrish, W., Editors, X-Ray and Electron Methods of Analysis, p. 1–35, Plenum Press (1968).Google Scholar
12. Parrish, W., “Role of Diffractometer Geometry in the Standardization of Polycrystalline Data,” in C. L. Grant, , Barret, C. S., Newkirk, J. B. and Rudd, C. O., Editors, Advances in X-Ray Analysis, Vol. 17, p. 97–105, Plenum Press (1974).Google Scholar
13. Huang, T. C. and Parrish, W., “Qualitative Analysis of Complicated Mixtures by Profile Fitting X-Ray Diffractometer Patterns,” in Barrett, C. S., Leyden, D. E., Newkirk, J. B. and Rudd, C. O., Editors, Advances in X-Ray Analysis. Vol. 21. p. 275–288 (1978).Google Scholar
14. Jenkins, R., “Interdependence of X-Ray Diffraction and X-Ray Fluorescence Data,” in Barrett, C. S., Leyden, D. E., Newkirk, J. B. and Rudd, C. O., Editors, Advances in X-Ray Analysis, Vol. 21, p. 7–22 (1978).Google Scholar
15. Langford, J. I. and Wilson, A. J. C., “Scherrer After Sixty Years: A Survey and Some New Results in the Determination of Crystallite Size,” J. Appl. Cryst. 11, 102–113 (1978).Google Scholar
16. Wagner, C. H. J., “Analysis of the Broadening and Changes in Position of Peaks in an X-Ray Powder Pattern,” in Cohen, J. B. and Hillard, J. E., Editors, Local Atomic Arrangements Studied by X-Ray Diffraction, p. 218–268, Gordon and Breach Science (1966).Google Scholar
17. Warren, B. E., “X-Ray Diffraction,” p. 251–314, Addison-Welsley (1969).Google Scholar
18. Gangulee, A., “Separation of the Partical Size and Microstrain Components in the Fourier Coefficients of a Single Diffraction Profile,” J. Appl. Cryst. 7, 434–439 (1974).Google Scholar
19. Wagner, C. N. J., “A Fortran IV Program for the Analysis of Position and Profiles of X-Ray Powder Pattern Peaks,” Technical Report No. 15, Office of Kaval Research, M0NR 609 (43) (1966).Google Scholar
20. Davies, J. E. and Giess, E. A., “The Design of Single Crystal Materials for Magnetic Bubble Domain Applications,” J. Mat. Sci. 10, 2156-2170 (1975).Google Scholar
21. Bond, W. L., “Device for Preparing Accurately X-Ray Oriented Crystals,” J. Sci, Instr. 38, 63–64 (1961).Google Scholar
22. Hart, M. and Lloyd, K. H., “Measurement of Strain and Lattice Parameter in Expitaxial Layers,” J. Appl. Cryst. 8 , 42–44 (1975).Google Scholar