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Unidirectional self-patterning of CaF2 nanorod arrays using capillary pressure

Published online by Cambridge University Press:  19 January 2011

D. Han ,
H. Li ,
T.M. Lu  and
A.J. Steckl
D. Han
Affiliation:
Nanoelectronics Laboratory, Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, Ohio 45221-0030
H. Li
Affiliation:
Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590
T.M. Lu
Affiliation:
Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590
A.J. Steckl*
Affiliation:
Nanoelectronics Laboratory, Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, Ohio 45221-0030
*
a)Address all correspondence to this author. e-mail: a.steckl@uc.edu
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Abstract

Highly aligned microstrip patterns consisting of biaxial CaF2 nanorods have been successfully self-assembled by simply using capillary pressure. The alignment direction of the microstrips is perpendicular to the flux direction during nanorod growth. Aligning behavior and pattern width can be controlled by changing wetting time and surface tension of the liquid. Higher surface tension and longer wetting time result in wider pattern width and better alignment. Taller nanorod height also results in better pattern alignment. Simple and cost-effective self-aligned microstrip patterns can be potentially used as a template for various applications, such as superhydrophobic surfaces, tissue scaffolds, microchannels, and optical polarizers.

Keywords

NanostructureSelf-AssemblyThin Film
Type
Reviews
Information
Journal of Materials Research , Volume 26 , Issue 2: Focus Issue: Self-Assembly and Directed Assembly of Advanced Materials , 28 January 2011 , pp. 223 - 229
Copyright
Copyright © Materials Research Society 2011

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References

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