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Influence of ion density on electron-beam propagation from a gas-filled diode

Published online by Cambridge University Press:  01 January 1999

HAN S. UHM
Affiliation:
Department of Physics, Ajou University, San 5 Wonchon-Dong, Paldal-Gu, Suwon 442-749, Korea
E. H. CHOI
Affiliation:
Department of Electrophysics and Research Institute of Basic Science, Kwangwoon University, Seoul 139-701, Korea
J. J. KO
Affiliation:
Department of Electrophysics and Research Institute of Basic Science, Kwangwoon University, Seoul 139-701, Korea
H. M. SHIN
Affiliation:
Department of Electrophysics and Research Institute of Basic Science, Kwangwoon University, Seoul 139-701, Korea
G. S. CHO
Affiliation:
Department of Electrophysics and Research Institute of Basic Science, Kwangwoon University, Seoul 139-701, Korea

Abstract

Electron-beam propagation from a gas-filled diode is investigated. The beginning portion of the electron beam pulse creates an ion channel not only inside the diode but also in the region beyond the anode. A theoretical model is developed for the space-charge-limited current of a relativistic electron beam propagating through an ion channel. A simple analytical expression for the space-charge-limited current is obtained within the context of a thin-beam approximation, where the conducting-tube radius is much larger than the beam radius. The beam current propagating through an ion channel is measured experimentally for a mildly relativistic electron beam. Whenever the ion density inside the diode is the same as the beam electron density, the diode is short-circuited. The ion-channel density at the short-circuiting time is calculated numerically and is used to estimate the space-charge-limited current. It is shown that the experimental data agree well with the analytical results predicted by the theoretical model.

Type
Research Article
Copyright
© 1999 Cambridge University Press

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