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Nano-structuring of solid surface by extreme ultraviolet Ar8+ laser

Published online by Cambridge University Press:  30 December 2011

K. Kolacek ,
J. Straus ,
J. Schmidt ,
O. Frolov ,
V. Prukner ,
A. Shukurov ,
V. Holy ,
J. Sobota  and
T. Fort
K. Kolacek*
Affiliation:
Institute of Plasma Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
J. Straus
Affiliation:
Institute of Plasma Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
J. Schmidt
Affiliation:
Institute of Plasma Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
O. Frolov
Affiliation:
Institute of Plasma Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
V. Prukner
Affiliation:
Institute of Plasma Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
A. Shukurov
Affiliation:
Faculty of Mathematics and Physics, Charles University in Prague, Czech Republic
V. Holy
Affiliation:
Faculty of Mathematics and Physics, Charles University in Prague, Czech Republic
J. Sobota
Affiliation:
Institute of Scientific Instruments, Academy of Sciences of the Czech Republic, Brno, Czech Republic
T. Fort
Affiliation:
Institute of Scientific Instruments, Academy of Sciences of the Czech Republic, Brno, Czech Republic
*
Address correspondence and request for reprint to: Karel Kolacek, Institute of Plasma Physics, Academy of Sciences of the Czech Republic, v.v.i., Za Slovankou 1782/3, 182 00 Prague 8, Czech Republic. E-mail: kolacek@ipp.cas.cz
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Abstract

This work demonstrates the patterning of polymethylmethacrylate (PMMA) by ablation with Ar8+ ion laser (λ = 46.9 nm) pumped by pulse, high-current, capillary-discharge. For focusing a long-focal spherical mirror (R = 2100 mm) covered by 14 double-layer Sc-Si coating was used. The ablated focal spots demonstrate not only that the energy of our laser is sufficient for such experiments, but also that the design of focusing optics must be more sophisticated: severe aberrations were revealed — an irregular spot shape and strong astigmatism with astigmatic difference as large as 16 mm. In some cases, on the bottom of ablated spots a laser-induced periodic surface structure appeared. Finally, an illumination of the sample through quadratic hole 7.5 × 7.5 µm, standing in contact with PMMA substrate ablated from the surface a strongly developed two-dimensional diffraction pattern (period in the center about 125 nm).

Keywords

Ablation by EUV radiationApplication of Ar8+ laserNano-patterning by EUV radiationNano-structuring by EUV radiation
Type
Research Article
Information
Laser and Particle Beams , Volume 30 , Issue 1 , March 2012 , pp. 57 - 63
Copyright
Copyright © Cambridge University Press 2011

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