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Realizing high aspect ratio silver micro and nanostructures by microcontact printing of alkyl thiol self-assembled monolayers

Published online by Cambridge University Press:  17 May 2019

Amare Benor ,
Asman Tamang ,
Veit Wagner ,
Alberto Salleo  and
Dietmar Knipp
Amare Benor*
Affiliation:
Department of Physics, Bahir Dar University, Bahir Dar, Ethiopia Department of Physics, Addis Ababa University, Addis Ababa, Ethiopia
Asman Tamang
Affiliation:
Jacobs University Bremen, Bremen, Germany
Veit Wagner
Affiliation:
Jacobs University Bremen, Bremen, Germany
Alberto Salleo
Affiliation:
Geballe Laboratory for Advanced Materials, Department of Materials Science and Engineering, Stanford University, Stanford, USA
Dietmar Knipp*
Affiliation:
Jacobs University Bremen, Bremen, Germany Geballe Laboratory for Advanced Materials, Department of Materials Science and Engineering, Stanford University, Stanford, USA
*
*Corresponding authors:dknipp@stanford.edu and amarebenor@gmail.com
*Corresponding authors:dknipp@stanford.edu and amarebenor@gmail.com
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Abstract

The patterning of gold and silver micro and nanostructures on rigid and flexible substrates is investigated by microcontact printed thiol based self-assembled monolayers. The aspect ratio of the noble metal micro and nanostructures is determined by interaction of the -SH head group of the CH3(CH2)19SH molecules and the surface of the noble metal. Silver micro and nanostructures with >10 times higher aspect ratios can be realized in comparison to commonly realized gold micro and nanostructures. The printing process is described, and the etching process is characterized in terms of etching window and etching selectivity. Potential electronic and photonic applications of the micro and nanostructures are discussed taking the boundary conditions of the printing process and the selected material system into consideration.

Keywords

thin filmmicroelectromechanical systems (MEMS)microelectronicsself-assemblyphysical vapor deposition (PVD)
Type
Articles
Information
MRS Advances , Volume 4 , Issue 44-45: Characterization, Processing and Theory , 2019 , pp. 2441 - 2451
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Copyright
Copyright © Materials Research Society 2019 

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References

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