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Subwavelength grating wideband reflectors with tapered sidewall profile

Published online by Cambridge University Press:  21 December 2015

W. Yu
Affiliation:
University of Michigan, MI
D. Wu
Affiliation:
University of Michigan, MI
X. Duan
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA
Y. Yi*
Affiliation:
University of Michigan, MI Massachusetts Institute of Technology, Cambridge, MA
*
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Abstract

One main difference between practical device and ideal design for subwavelength grating structure is the tapered sidewall profile of grating, which is normally obtained by the practical CMOS-compatible fabrication and etching process. Our work has investigated the impacts of tapered sidewall profile on the subwavelength grating wideband reflector characteristics. Both zero-contrast gratings (ZCG) and high- contrast gratings (HCG) are numerically investigated in detail and the results show a distinct differences of the impacts of tapered sidewall profile of grating. The simulation results reveal that this factor play a critical role in determining the reflection bandwidth, average reflectance, and the band edge. Our study has potential in guiding the utilization of subwavelength grating wideband reflector on application of a variety of nanophotonic devices and their integration, as well as to facilitate the design of the fabrication process on the control of tapered sidewall profile.

Type
Articles
Copyright
Copyright © Materials Research Society 2015 

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