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0.5 MeV Submicron Ion Probe System for RBS/PIXE.

Published online by Cambridge University Press:  25 February 2011

K. Inoue ,
M. Takai ,
K. IshibashI ,
Y. Kawata ,
N. Suzuki  and
S. Namba
K. Inoue
Affiliation:
Electronics Technology Center, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
M. Takai
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan.
K. IshibashI
Affiliation:
Electronics Technology Center, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
Y. Kawata
Affiliation:
Electronics Technology Center, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
N. Suzuki
Affiliation:
Electronics Technology Center, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
S. Namba
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan.
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Abstract

A nuclear microprobe-forming system for the microscopic RBS/PIXE measurement of micro devices has been developed and installed at the Research Center for Extreme Materials, Osaka University. The use of precision quadrupole magnets and an objective collimator ensures a final spot size of less than 1μm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 381
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

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