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Arups Studies of the Interaction of Co with the Interface States for Strained-Layer Cu on Ru 0001)

Published online by Cambridge University Press:  25 February 2011

J. E. Houston
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
C. H. F. Peden
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
P. J. Feibelman
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
D. R. Hamann
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 21376
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Abstract

During the growth of the first monolayer, Cu has been shown to form in 2d islands pseudomorphic to the Ru 0001) surface under a tensile strain of -6%. The chemical behavior of such films has been found to be unlike that of either of the pure elements both from the standpoint of catalytic activity and molecular adsorption properties. In addition, these strainedlayer films have unique electronic properties. Specifically, we have identified a set of interface and surface states near the K point in the surface Brillioun zone. Here are shown new results concerning the behavior of the interface states with respect to CO adsorption. Specifically, CO is found to attenuate all Cu/Ru ARUPS structures except those due to the antibonding components of the interface states and these components move to higher binding energy with CO coverage. An analysis of these results, based on the properties of the interface states, indicates that there is negligible direct interaction between the CO orbitals and the metal d states. The increased bonding that is seen for CO on Cu/Ru compared to CO on Cu is suggested to result from an enchanced polarizability of the Cu 4s states due to the proximity of the Ru substate.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

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