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Atomic-Scale Dynamic Deformation Behavior of BN Thin Films

Published online by Cambridge University Press:  11 February 2011

Chihiro Iwamoto ,
Hangsheng Yang  and
Toyonobu Yoshida
Chihiro Iwamoto
Affiliation:
Engineering Research Institute, School of Engineering, The University of Tokyo, Yayoi 2–11–16, Bunkyo-ku, Tokyo 113–8656, Japan
Hangsheng Yang
Affiliation:
Department of Materials Engineering, School of Engineering, The University of Tokyo, Hongo 7–3–1, Bunkyo-ku, Tokyo 113–8656, Japan
Toyonobu Yoshida
Affiliation:
Department of Materials Engineering, School of Engineering, The University of Tokyo, Hongo 7–3–1, Bunkyo-ku, Tokyo 113–8656, Japan
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Abstract

Deformation behavior of the BN film was dynamically observed by high-resolution transmission electron microscopy. BN thin films were deposited on a narrow edge of Si flakes, using inductively coupled plasma-enhanced chemical vapor deposition. High-resolution observation of the sample revealed that the BN film was possibly deposited on the edge of the Si thinned to less than 10 nm in thickness, whose morphology varied depending on the thickness of the Si edge. Intriguing mechanical properties of the BN films, especially relating their dynamic behavior, were clearly verified by the high-resolution observation with piezo-ceramic tube for three-axis positioning of an indenter.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y5.21
Copyright
Copyright © Materials Research Society 2003

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References

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