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Chemical Vapor Deposition of Ultrafine Ceramic Structures

Published online by Cambridge University Press:  21 February 2011

B. M. Gallois ,
R. Mathur ,
S. R. Lee  and
J. Y. Yoo
B. M. Gallois
Affiliation:
Department of Materials and Metallurgical Engineering Stevens Institute of Technology, Hoboken, NJ 07030
R. Mathur
Affiliation:
Department of Materials and Metallurgical Engineering Stevens Institute of Technology, Hoboken, NJ 07030
S. R. Lee
Affiliation:
Department of Materials and Metallurgical Engineering Stevens Institute of Technology, Hoboken, NJ 07030
J. Y. Yoo
Affiliation:
Department of Materials and Metallurgical Engineering Stevens Institute of Technology, Hoboken, NJ 07030
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Abstract

Ultrafine ceramic structures based on the nitrides and carbides of titanium and silicon have been synthesized in a computer-controlled hot-wall CVD reactor. Layered deposits have been produced by pulsing the reactant gases judiciously under software control. The development of a columnar structure which is endemic to most CVD materials has been suppressed. Skeletal structures of filaments have also been grown with appropriate catalysts by the vapor-liquid-solid mechanism and immediately infiltrated in situ with different materials to produce filament-reinforced composite coatings.

Ultrafine-grained carbon films and filaments have been grown from methane-hydrogen mixtures by RF plasma-assisted CVD. The microstructural features of these materials are of the order of 20 to 100 nm. The subgrain structure determined by Raman spectroscopy varies from 2 to 3 nm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 132: Symposium G – Multicomponent Ultrafine Microstructures , 1988 , 49
Copyright
Copyright © Materials Research Society 1989

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References

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