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Chemical Vapor Deposition of Vanadium Oxide Tiiin Films

Published online by Cambridge University Press:  15 February 2011

Ogie Stewart ,
Joan Rodriguez ,
Keith B. Williams ,
Gene P. Reck ,
Narayan Malani  and
James W. Proscia
Ogie Stewart
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202.
Joan Rodriguez
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202.
Keith B. Williams
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202.
Gene P. Reck
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202.
Narayan Malani
Affiliation:
Ford Motor Company, Glass Division, Dearborn, MI 48120.
James W. Proscia
Affiliation:
Ford Motor Company, Glass Division, Dearborn, MI 48120.
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Abstract

Vanadium oxide thin films were grown on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) from the reaction of vanadium(IV) chloride with isopropanol and t-butanol. Films were deposited in the temperature range 250 to 450°C. The as-deposited films were a dark greenish color consistent with formation of a lower oxide of vanadium. Annealing a film deposited on Corning 7059 glass in air converted the material to a yellow film. X-ray diffraction of the yellow film revealed the presence of V2O5. Optical spectra of the films are presented. Glass substrates previously coated with conductive fluorine doped tin oxide were coated with V2O5 and evaluated for electrochromic activity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 335: Symposium Y – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics , 1993 , 329
Copyright
Copyright © Materials Research Society 1994

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References

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