Hostname: page-component-84b7d79bbc-rnpqb Total loading time: 0 Render date: 2024-07-25T14:13:47.745Z Has data issue: false hasContentIssue false
  • English
  • Français

Diamond Growth on (a) Large Mo Cylinders at 30 Torr and (b) Flat Mo at One Atmospheric Pressure of H2 and CH4

Published online by Cambridge University Press:  10 February 2011

R. Ramesham  and
M. F. Rose
R. Ramesham
Affiliation:
Space Power Institute, 231 Leach Center, Auburn University, Auburn, AL 36849-5320
M. F. Rose
Affiliation:
Space Power Institute, 231 Leach Center, Auburn University, Auburn, AL 36849-5320
Get access

Abstract

(a) Polycrystalline diamond films have been grown on cylindrical Mo substrates by hot filament and microwave plasma CVD techniques using a gas mixture of hydrogen and methane. A single hot tungsten filament has been used to demonstrate the growth of adherent diamond films on large cylinders. To our knowledge this is the first report on such large cylindrical substrate (area: 41 cm2 ) using a single filament of active length of 3.75 cm. (b) Polycrystalline diamond films have been deposited by hot-filament technique for the first time using methane and hydrogen at an atmospheric pressure of hydrogen on flat substrates. The diamond growth has been performed at various pressures ranging from 34.5 to 750 Torr. The as-deposited films were analyzed by SEM and Raman to determine morphology and chemical nature, respectively.

A. Growth of Diamond Film on Molybdenum Cylinders

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 659
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Field, J.E., “The Properties of Diamond,” Academic Press, London, 1979.Google Scholar
2. Ramesham, R., Rose, M.F., Askew, R.F., Bekker, T.L., Dayton, J.A. Jr., Krainsky, I.L., Mearini, G., Vanzant, L., File, D.M., Gilmour, A.S. Jr., and Ayres, V., Surface and Coatings Technology Vol. 64/2 (1994) 81–86.Google Scholar
3. Mearini, G.T., Krainsky, I.L., Wang, Y.X., Dayton, J.A. Jr., Ramesham, R., Rose, M.F., Thin Solid Films, 253 (1994) 151.Google Scholar
4. Himpsel, F.J., Knapp, J.A., Vechten, J.A. Van and Eastman, D.E., Phys. Rev. B, 20(2) (1979) 624.Google Scholar
5. Kassmann, D.E. and Badgwell, T.A., in Applications of Diamond Films and Related Materials, Edited by Feldman, A., Tzeng, Y., Yarbrough, W.A., Yoshikawa, M., Murakawa, M., NIST SP 885, 1995, pp. 665–668.Google Scholar
6. Taweechokesupsin, O., Kovach, C., Morrison, P.W. Jr., Angus, J.C., in Diamond Films-95, The 6th European Conference on Diamond, Diamond-Like and Related Materials, Barcelona, Spain, Sep 1995, Abstract 4.2.Google Scholar
7. Obata, T. and Morimoto, S., Diamond Optics II, Edited by Feldman, A. and Holly, S., SPIE Proceedings, Vol 1146, 1989, pp. 208–216.Google Scholar
8. Adams, S.F. and Landstrass, M.I., in Applications of Diamond Films and Related Materials, Edited by Tzeng, Y., Yoshikawa, M., Murakawa, M., Feldman, A., Materials Science Monographs 73, Elsevier, 1991, pp. 371–376.Google Scholar
9. Ramesham, R. and Roppel, T., J. Mater. Res., 7 (1992) 1144.Google Scholar
10. Matsumoto, S., Sato, Y., Tsutsumi, M., and Setaka, N., J. Mater. Sci., 17 (1982) 3106.Google Scholar
11. Girshick, S.L., Li, C., Yu, B.W., and Han, H., ”Fluid boundary layer effects in atmosphericpressure plasma diamond film deposition,” in Plasma Chemistry and Plasma Processing, 13 (1992) 169.Google Scholar
12. Murakawa, M., Okada, T., and Takeuchi, S., “Diamond coating under atmospheric pressure by means of a rotating DC arc,” in 2nd International Conference on the Applications of Diamond Films and Related Materials, edited by Yoshikawa, M., Murakawa, M., Tzeng, Y., and Yarbrough, W.A., MY, Tokyo, Japan, 1993, p. 497.Google Scholar
13. Hirata, A., Uchida, T., Yoshikawa, M., “Effect of process pressure on diamond growth by arc discharge plasma jet CVD method,” in 2nd International Conference on the Applications of Diamond Films and Related Materials, edited by Yoshikawa, M., Murakawa, M., Tzeng, Y., and Yarbrough, W.A., MY, Tokyo, Japan, 1993, p. 469.Google Scholar
14. Wei, J. and Tzeng, Y., Diamond Films and Technology, 5 (1995) 79–86.Google Scholar
15. Kim, J.W., Baik, Y.J., Eun, K.Y., and Yoon, D.N., Thin Solid Films, 212 (1992) 104.Google Scholar
16. Moustakas, T.D., “Growth of diamond by CVD methods and effects of process parameters,” in Synthetic Diamond, Emerging CVD Science and Technology, Edited by Spear, K.E. and Dismukes, J.P., John Wiely & Sons, Inc., New York, 1994, p. 145.Google Scholar
17. Ramesham, R., Rose, M F., and Askew, R.F., J. Mater. Sci. Lett., 15 (1996) 1551.Google Scholar