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Dislocation Distributions in Cd1-xHgxTe/CdTe and Cd1-xHgxTe/Cd1-yZnyTe Grown by Liquid Phase Epitaxy

Published online by Cambridge University Press:  21 February 2011

C. C. R. Watson
Affiliation:
Physics Dept., University of Durham, South Rd, Durham, DH1 3LE, U.K.
K. Durose
Affiliation:
Physics Dept., University of Durham, South Rd, Durham, DH1 3LE, U.K.
E. O’Keefe
Affiliation:
GEC - Marconi IR, Southampton, UK.
J. M. Hudson
Affiliation:
Physics Dept., University of Durham, South Rd, Durham, DH1 3LE, U.K.
B. K. Tanner
Affiliation:
Physics Dept., University of Durham, South Rd, Durham, DH1 3LE, U.K.
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Abstract

Epilayers of LPE Cdo.24Hgo.76Te grown on (111)B CdTe and Cdi-xZnxTe substrates have been examined by defect etching and triple axis x-ray diffraction. Defect etching of bevelled layers has shown the threading dislocation density to fall with increasing distance from the heterointerface, for distances <6μm. In thicker regions however a constant ‘background’ dislocation density is observed. Background dislocation densities of ∼ 3 x 105cm-2 and 9 x 104cm-2 have been measured for layers grown on CdTe and Cdo.96Zn0.04Te respectively, this is compared with a substrate dislocation density of ∼ 3 x 104cm-2 measured in both types of substrates. The increase in the dislocation density within the epilayers compared with the corresponding substrate is discussed. An explanation is also given for the displacement of the peak dislocation density, from the interface to within the layer, observed in the Cd0.76Hg0.24Te / Cd0.96Zn0.04Te system.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

1. Bernardi, S., Bocchi, C., Ferrari, C., Franzosi, P. and Lazzarini, L., J. Crystal Growth 113, 53 (1991).Google Scholar
2. Chandra, D., Tregligas, J.H. and Goodwin, M.W., J. Vac.Sci. Technol. B9, 3, 1852 (1991).Google Scholar
3. Yoshikawa, M., J. Appl. Phys. 63, 1533 (1987).Google Scholar
4. Matthews, J.W. and Blakeslee, A.E., J. Crystal Growth 27, 118 (1974).Google Scholar
5. Capper, P., Harris, J.E., O’Keefe, E., Jones, C.L., Ard, C.K., Mackett, P. and Dutton, D., Mats. Sci. Eng. B16, 29 (1993).Google Scholar
6. Durose, K. and Tatsuoka, H., Inst. Phys. Conf. Ser., 134, 581 (1993).Google Scholar
7. Hähnert, I. and Schenk, M., J. Crystal Growth 101, 251 (1990).Google Scholar
8. Watson, C.C.R., Durose, K., Banister, A.J., O’Keefe, E. and Bains, S.K., Mats. Sci. Eng. B16, 113 (1993).Google Scholar
9. Tanner, B.K. and Bowen, K., J. Crystal Growth 126, 1 (1993).Google Scholar
10. Ayers, J.E., Ghandhi, S.K. and Schowater, L.J., Mater. Res. Soc Symp. Proc 209, 661 (1991).Google Scholar
11. Nouruzi-Khorasani, A., Jones, I.P., Dobson, P.S., Williams, D.J. and Astles, M.G., J.Crystal Growth 96, 348 (1989).Google Scholar
12. Matthews, J.W. (Ed.) , Epitaxial Growth Part B, (Academic Press, New York, 1975), p. 598.Google Scholar