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Drift Mobility Measurements Under Single and Double Injection in a-Si:H
Published online by Cambridge University Press: 26 February 2011
Abstract
Drift mobility measurements under high level double injection in p/i/n and single injection in M/i/n devices have been made as a function of d.c. voltage and temperature using a small step voltage technique. For comparable ratio's of V/L2 the transit time of injected electrons was of order one decade shorter under double injection than under single injection. The room temperature drift mobility for single injection was approximately 1cm2−1s−1. We attribute the difference in drift transit time to a higher extended state mobility with double injection than with single injection due to the neutralization of charged defects.
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- Copyright © Materials Research Society 1987
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