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The Effects of Ion Energy on Carbon and Tungsten Films Fabricated by Direct Ion Beam Deposition and Ion Beam Sputtering Deposition

Published online by Cambridge University Press:  16 February 2011

I. Kataoka
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
K. Ito
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
N. Hoshi
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
T. Yonemitsu
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
K. Etoh
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
I. Yamada
Affiliation:
Japan Aviation Electronics Industry, Ltd., 1–1, Musashino 3-chome, Akishimashi, Tokyo, 196, Japan
Jean-Jacques Delaunay
Affiliation:
Université Louis Pasteur, Ecole Nationale Supérieure de Physique de Strasbourg, Strasbourg, France
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Abstract

The x-ray reflectivity and surface morphology of C/W multilayers fabricated by ion beam sputtering (IBS) method was evaluated. Also the surface roughness and amorphous structure of C and W films fabricated by direct ion beam deposition (DIBD) method were evaluated as a function of ion energy. The reflectivity was measured by the C-K line (4.47nm) and STM was used for surface roughness measurement and root-mean-square value of correlation function of the RHEED pattern was used for evaluation of amorphous structure. The reflectivity of C/W multilayer was about 69% of the theoretical one, and micro-columnar structures were observed from STM images. The film structure and surface roughness of DIBD film were changed with the depositing ion energy. The surface roughness of films becomes smaller as the depositing energy becomes higher in the energy range from 20 to 140eV.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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