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Electrochemical Corrosion Inhibition System for Photoresist Stripper for New Copper FPD Manufacturing

Published online by Cambridge University Press:  01 February 2011

Seiji Inaoka  and
Sang In Kim
Seiji Inaoka
Affiliation:
seiji.inaoka@tycohealthcare.com, Tyco Healthcare, Mallinckrodt Baker, 1904 JT Baker Way, Bldg 122, Phillipsburg, NJ, 08865, United States
Sang In Kim
Affiliation:
si.kim@tycohealth.co.kr, Tyco Healthcare, Mallinckrodt Baker, Pyeongtaek, N/A, Korea, Republic of
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Abstract

Development of photoresist stripper with copper compatibility is challenging as conventional corrosion inhibitors do not protect the metal as expected. Copper corrosion inhibition mechanism of newly developed photoresist stripper is proposed that significantly reduces copper corrosion with small amount of corrosion inhibitor.

Keywords

corrosionelectrochemical synthesisCu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 990: Symposium B – Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics , 2007 , 0990-B08-26
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

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3The solution with only Component B showed etch rate of 280å/min at 70°C.Google Scholar
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