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Electrodeposition of Fluorescent Si Nanomaterial From Acidic Sodium Silicate Solutions

Published online by Cambridge University Press:  01 February 2011

Laila H. Abuhassan  and
Munir H. Nayfeh
Laila H. Abuhassan
Affiliation:
Research Division, NanoSi Technologies, Inc., EnterprizeWorks, Champaign, IL 61820
Munir H. Nayfeh
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL 61801 Department of Physics, University of Jordan, Amman, Jordan
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Abstract

We developed a procedure for the electrodeposition of fluorescent silicon nanomaterial from silicates on conducting substrates. The electrodeposion solution used is a solution of sodium metasilicon salts (Na2SiO3) in HF/H2O2. When a positively biased platinum substrate is immersed in the bath, a current is drawn and a thin fluorescent coating is formed on the substrate. We discuss the results in terms of current-induced nucleation of silicon nanostructures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 862: Symposium A – Amorphous and Nanocrystalline Silicon Science and Technology–2005 , 2005 , A8.10
Copyright
Copyright © Materials Research Society 2005

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References

1 Canham, L.T., Appl. Phys. Lett. 57, 1046 (1990); See for example: A. G. Cullis, L.T. Canham, and P. Calcott, J. Appl. Phys. 82, 909 (1997).10.1063/1.103561Google Scholar
2 Akcakir, O., Therrien, J., Belomoin, G., Barry, N., Gratton, E., and Nayfeh, M. Appl. Phys. Lett. 76, 1857 (2000); G. Belomoin, J. Therrien, A. Smith, S. Rao, R. Twesten, S. Chaieb, L. Wagner, L. Mitas, and M. Nayfeh, Appl. Phys. Lett. 80, 841 (2002).10.1063/1.126191Google Scholar
3 Zhu, J. G., White, C. W., Budai, J. D., Withrow, S. P., and Chen, Y., J. Appl. Phys. 78, 4386 (1995); W. A. Saunders, P. C. Sercel, R. B. Lee, H. A. Atwater, K. J. Vahala, R. C. Flagan, and E. J. Escorcia-Aparcio, Appl. Phys. Lett. 63, 1549 (1993).10.1063/1.359843Google Scholar
4 Risbud, S. H., Liu, L.-C., and Shackelford, J. F., Appl. Phys. Lett. 63, 1648 (1993); M. Fujii, S. Hayashi, and K. Yamamoto, Jpn. J. Appl. Phys. 30, 687 (1991); T. Yoshida, T. Takeyama, Y. Yamada, and K. Mutoh, Appl. Phys. Lett. 68, 1772 (1996).10.1063/1.110724Google Scholar
5 Fojtik, A., Weller, H., Fiechter, S., and Henglein, A., Chem. Phys. Lett. 134, 477 (1987); A. Fojtik, and A. Henglein, Chem. Phys. Lett. 221, 363 (1994).10.1016/0009-2614(87)87176-2Google Scholar
6 Wu, J. J and Flagan, R. C., J. Appl. Phys. 73, 407 (1993).Google Scholar
7 Takagi, H., Ogawa, H., Yamazaki, Y., Ishizaki, A., and Nakagiri, T., Appl. Phys. Lett. 56, 2379 (1990).10.1063/1.102921Google Scholar
8 Okada, R. and Iijima, S., Appl. Phys. Lett. 58, 1662 (1991).10.1063/1.105129Google Scholar
9 DiMaria, D. J. et al., J. Appl. Phys. 56, 401 (1998); S. Berger, L. Schächter, and S. Tamir, Nanostruct. Mater. 8, 231, (1997).10.1063/1.333979Google Scholar
10 Wilcoxon, J. P., Samara, G. A., and Provencio, P. N., Phys. Rev. B 60, 2704 (1999).10.1103/PhysRevB.60.2704Google Scholar
11 Heath, J. R., Science 258, 1131 (1992); R. K. Baldwin, K. A. Pettigrew, J. C. Garno, P. P. Power, G. Liu, and S. M. Kauzlarich, J. Am. Chem. Soc. 124, 1150 (2002)10.1126/science.258.5085.1131Google Scholar
12 Yang, Ch.S., Bley, R. A., Kauzlarich, S. M., Lee, H. W. H., and Delgado, G. R., J. Am. Chem. Soc. 121, 5191 (1999).10.1021/ja9828509Google Scholar
13 Holmes, J. D., Ziegler, K. J., Doty, R. C., Pell, L. E., Johnston, K. P., and Korgel, B. A., J. Am. Chem. Soc. 123, 3743 (2001).10.1021/ja002956fGoogle Scholar
14 Belomoin, G., Therrien, J., and Nayfeh, M., Appl. Phys. Lett. 77, 779, (2000); Zain Yamani, Howard Thompson, Laila AbuHassan, and Munir H. Nayfeh Appl. Phys. Lett. 70, 3404 (1997); D. Andsager, J. Hilliard, J. M. Hetrick, L. H. AbuHassan, M. Plisch, and M. H. Nayfeh, J. Appl. Phys. 74, 4783 (1993); Z. Yamani, S. Ashhab, A. Nayfeh and M. H. Nayfeh, J. Appl. Phys. 83, 3929 (1998).10.1063/1.1306659Google Scholar
15 Zukalova, M., Rathousky, J., and Zukal, A. Collect. Czech Chem. Comm. 68, 2019 (2003).10.1135/cccc20032019Google Scholar