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Electron Energy Distribution Functions in RF Molecular Plasmas

Published online by Cambridge University Press:  28 February 2011

M. Dilonardo ,
M. Capitelli ,
R. Winkler  and
J. Wilhelm
M. Dilonardo
Affiliation:
Centro di Studio per la Chimica dei Plasmi del C.N.R.and Dipartimento di Chimica dell'Università – Via G.Amendola 173 – 70126 Bari –Italy.
M. Capitelli
Affiliation:
Centro di Studio per la Chimica dei Plasmi del C.N.R.and Dipartimento di Chimica dell'Università – Via G.Amendola 173 – 70126 Bari –Italy.
R. Winkler
Affiliation:
Zentralinstitut fur Elektronenphysik - AdW Gasentladungsphysik “Rudolf Seiliger” – 2200 Greifswald – DDR.
J. Wilhelm
Affiliation:
Zentralinstitut fur Elektronenphysik - AdW Gasentladungsphysik “Rudolf Seiliger” – 2200 Greifswald – DDR.
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Abstract

Electron energy distribution functions in molecular rf plasmas (CO, SF6 ) have been calculated by numerically solving the time dependent Boltzmann equation in a wide range of field frequencies up to the establishment of the periodic state.Particular attention is given to the reduction of the modulation degree and phase shift with respect to the rf field of the isotropic distribution function and of some macroscopic quantities as a function of frequency.Time averages of distribution functions and of some macroscopic quantities are then compared with the corresponding results obtained by using the effective field approximation.Finally we discuss the role of the second kind collisions in affecting the results.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 287
Copyright
Copyright © Materials Research Society 1986

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References

[1] Margenau, H., Phys.Rev., 69, 508 (1946).Google Scholar
[2] Winkler, R., Deutcsh, H., Wilhelm, J. and Wilke, Ch., Beitr.Plasmaphys., 24, 285 (1984).Google Scholar
[3] Winkler, R., Wilhelm, J. and Hess, A., Ann.Phys., 42, 537 (1985).CrossRefGoogle Scholar
[4] Winkler, R., Capitelli, M., Dilonardo, M., Gorse, C. and Wilhelm, J., Plasma Chem.Plasma Proc., in press.Google Scholar
[5] Gorse, C. and Capitelli, M., Chem.Phys., 85, 177 (1984) and references therein.Google Scholar
[6] Capitelli, M. and Dilonardo, M., Z.Naturforsch., 34a, 585 (1979); C.Gorse, M.Capitelli and A.Ricard, J.Chem.Phys., 82, 1900 (1985); C.Gorse, F.Paniccia, J.Bretagne and M.Capitelli, J.Appl.Phys., 59, 731 (1986); J.Appl.Phys., in press.CrossRefGoogle Scholar
[7] Capitelli, M., Dilonardo, M., Winkler, R. and Wilhelm, J., Beitr.Plasmaphys., in press.Google Scholar