Hostname: page-component-586b7cd67f-tf8b9 Total loading time: 0 Render date: 2024-11-25T20:54:52.486Z Has data issue: false hasContentIssue false

Enhanced Luminescence and Optical Cavity Modes from Uniformly Etched Porous Silicon

Published online by Cambridge University Press:  25 February 2011

Vincent V. Doan
Affiliation:
Department of Chemistry, University of California at San Diego, La Jolla, CA 92093-0506
C. L. Curtis
Affiliation:
Department of Chemistry, University of California at San Diego, La Jolla, CA 92093-0506
G. M. Credo
Affiliation:
Department of Chemistry, University of California at San Diego, La Jolla, CA 92093-0506
M. J. Sailor
Affiliation:
Department of Chemistry, University of California at San Diego, La Jolla, CA 92093-0506
R. M. Penner
Affiliation:
Institute for Surface and Interface Science, Department of Chemistry, University of California at Irvine, Irvine, CA 92717
Get access

Abstract

Uniform layers of porous silicon have been produced in a photoelectrochemical etch that show intensity enhancements of up to 100 fold, relative to samples etched in the dark. These films can also show fine structure in their photoluminescence (PL) spectra characteristic of longitudinal optical cavity modes. The highly luminescent, uniform porous layer is generated by illumination with blue or green light during the electrochemical etch of singlecrystal (B-doped) Si, and the enhancement is attributed to a localized photochemical etch process. The relevance of the increased PL intensity and interference-induced spectral changes to measurements of the intrinsic emission spectrum of porous Si are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Pickering, C., Beale, M.I.J., Robbins, D.J., Pearson, P.J. and Greef, R., J. Phys. Chem. 17, 6535 (1984).Google Scholar
2. Lehmann, V. and Gosele, U., Appl. Phys. Lett. 58, 856858 (1990).Google Scholar
3. Canham, L.T., Appl. Phys. Lett. 57, 10461048 (1990).Google Scholar
4. Doan, V.V. and Sailor, M.J., Appl. Phys. Lett. 60, 619620 (1992).Google Scholar
5. Doan, V.V. and Sailor, M.J., Science 256, 17911792 (1992).Google Scholar
6. Smith, R.L., Chuang, S.-F. and Collins, S.D., J. Electron. Mater. 17, 533541 (1988).Google Scholar
7. Gaspard, F., Bsiesy, A., Ligeon, M., Muller, F. and Herino, R., J. Electrochem. Soc. 136, 30433046 (1989).CrossRefGoogle Scholar
8. Smith, R.L., Chuang, S.-F. and Collins, S.D., Sens. Actuat. A21–A23, 825829 (1990).CrossRefGoogle Scholar
9. Tsai, C., Li, K.-H., Kinosky, D.S., Qian, R.-Z., Hsu, T.-C., Irby, J.T., Banerjee, S.K., Tasch, A.F., Campbell, J.C., Hance, B.K. and White, J.M., Appl. Phys. Lett. 60, 17001702 (1992).Google Scholar
10. Tsai, C., Li, K.-H., Campbell, J.C., Hance, B.K., Arendt, M.F., White, J.M., Yau, S.-L. and Bard, A.J., J. Electron. Mater. 21, 9951000 (1992).Google Scholar
11. Suemune, I., Noguchi, N. and Yamanishi, M., Jpn. J. Appl. Phys. 31, L233–L236 (1992).Google Scholar
12. Asano, T., Higa, K., Aoki, S., Tonouchi, M. and Miyasato, T., Jpn. J. Appl. Phys. 31, L373–L375 (1992).Google Scholar
13. Aspnes, D.E. and Studna, A.A., Phys. Rev. B 27, 985 (1983).Google Scholar
14. Kumar, A. and Lewis, N.S., J. Phys. Chem. 94, 60026009 (1990).Google Scholar
15. Sailor, M.J. and Kavanagh, K.L., Adv. Mater. 4, 432434 (1992).Google Scholar
16. Rosi, B.. Optics (Addison-Wesley, Reading, MA, 1957), p. 125.Google Scholar