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Fabrication of planar SiON optical waveguide and its characterization

Published online by Cambridge University Press:  01 February 2011

Yu-Jeong Cho  and
Yeong-Cheol Kim
Yu-Jeong Cho
Affiliation:
gktqk@kut.ac.kr, Korea university of technology and education, materials engineering, 330-708, Choan, N/A, N/A, Korea, Republic of
Yeong-Cheol Kim
Affiliation:
yckim@kut.ac.kr, Korea, Republic of
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Abstract

Silicon oxynitride (SiON) was deposited as a core layer on a silica (SiO2) under-cladding layer by using plasma enhanced chemical vapor deposition (PECVD). The refractive index of the SiON core layer was varied between 1.45 and 1.78 by changing the gas flow ratio of SiH4, N2O and NH3. Etching experiments were performed using a dry etching equipment to fabricate the SiON core. An optical planar waveguide with a core and under-cladding thicknesses of 6 μm and 8 μm, respectively, and a refractive index contrast (Δn) of 7 % has been fabricated.

Keywords

plasma-enhanced CVD (PECVD) (deposition)opticalreactive ion etching
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 891: Symposium EE – Progress in Semiconductor Materials V – Novel Materials and Electronics and Optoelectronic Applications , 2005 , 0891-EE07-28
Copyright
Copyright © Materials Research Society 2006

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