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Gas Phase and Particle Diagnostic of Hmdso Plasmas by Infrared Absorption Spectroscopy

Published online by Cambridge University Press:  10 February 2011

D. Magni ,
C.H. Deschenaux ,
C. Courteille ,
A. A. Howling ,
C.H. Hollenstein  and
P. Fayet
D. Magni
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland
C.H. Deschenaux
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland
C. Courteille
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland
A. A. Howling
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland
C.H. Hollenstein
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland
P. Fayet
Affiliation:
Tetra Pak (Suisse) SA, Materials R–D Romont, Switzerland
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Abstract

FTIR spectroscopy has been applied to a radio-frequency discharge in hexamethyldisiloxane (HMDSO) diluted with oxygen and helium, as typically used for industrial SiOx, deposition. By measuring the infrared absorption of the HMDSO molecule, the gas consumption during processing can be monitored, allowing process optimization. Additional information on various infrared active radicals formed within the plasma, such as CO, CO2 and aldehydes, helps to elucidate the plasma chemistry in HMDSO plasmas. Besides information on the formation of gaseous components in the plasma, infrared transmission spectra give at the same time important data on the nature of the particle contamination.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 544: Symposium Y – Plasma Deposition and Treatment of Polymers , 1998 , 65
Copyright
Copyright © Materials Research Society 1999

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