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Growth, structure and properties of magnetron sputtered ultra-thin WTi films

Published online by Cambridge University Press:  02 May 2013

A. Le Priol
Affiliation:
Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope Chasseneuil, France Sagem Défense Sécurité, 72-74 rue de la Tour Billy, BP72, 95101 Argenteuil, France
E. Le Bourhis
Affiliation:
Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope Chasseneuil, France
P.-O. Renault
Affiliation:
Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope Chasseneuil, France
L. Simonot
Affiliation:
Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope Chasseneuil, France
G. Abadias
Affiliation:
Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope Chasseneuil, France
P. Muller
Affiliation:
Sagem Défense Sécurité, 72-74 rue de la Tour Billy, BP72, 95101 Argenteuil, France
H. Sik
Affiliation:
Sagem Défense Sécurité, 72-74 rue de la Tour Billy, BP72, 95101 Argenteuil, France
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Abstract

Refractory metal alloy WTi films were elaborated by magnetron sputtering from an alloyed target (W:Ti ∼ 70:30 at%). Film continuity threshold has been determined at 4.5 ± 0.2 nm using in situ surface differential reflectance (SDR) technique. Prior to film continuity, deposition of a continuous interfacial layer is suggested by both in situ and real-time SDR and wafer-curvature techniques. After continuity, WxTi1-x films (9.5 nm thick WTi films) have a body-centered structure with a {110} fiber texture. Composition (x) and microstructure can be tuned varying working pressure. A transition from compressive to tensile residual stresses was observed by ex situ XRD and wafer-curvature methods. Size dependent resistivity is obtained and slightly varies as a function of working pressure.

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Articles
Copyright
Copyright © Materials Research Society 2013

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References

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