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Hardening Mechanisms of Amorphous / Polycrystalline Nanostructured Multilayer Films: Si3N4/CrN and Si3N4/TiN

Published online by Cambridge University Press:  11 February 2011

Junhua Xu ,
Lihua Yu ,
Yasushi Azuma ,
Koichiro Hattori ,
Toshiyuki Fujimoto  and
Isao Kojima
Junhua Xu
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Lihua Yu
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Yasushi Azuma
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Koichiro Hattori
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Toshiyuki Fujimoto
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Isao Kojima
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
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Abstract

The amorphous/polycrystalline Si3N4/CrN and Si3N4/TiN nano-structured multilayer films have been fabricated by RF reactive magnetron sputtering. The microstructure and properties of these films were measured by XRD, HRTEM and nano-indenter There is no superhardness effect in the Si3N4/CrN multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20∼C, and are a little higher than those of Si3N4 films at a deposition temperature of 500°C. However, the superhardness effect was found in Si3N4/ TiN multilayers. The hardness of Si3N4/ TiN multilayers is affected not only by modulation periods, but also by layer thickness ratio and deposition temperature. The maximum hardness value is about 40% higher than the value calculated from the rule of mixtures at a deposition temperature of 500°C and a layer thickness ratio (lSi3N4/ lTiN) of 3 / 1. Based on experimental results, the hardening mechanisms in these multilayers have been discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y5.7
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

1. Veprek, S., Reiprich, S., and Shizhi, Li, Appl. Phys. Lett. 66, 2640 (1995).Google Scholar
2. Veprek, S., Nesladek, P., Niederhofer, A., Glatz, F., Jilek, M., and Sima, M., Surf. Coat. Technol. 108–109, 138 (1998).Google Scholar
3. Veprek, S., and Reiprich, S., Thin solid Films, 268, 64 (1995).Google Scholar
4. Koehler, J. S., Phys. Rev. B2, 547 (1970).Google Scholar
5. Cahn, W., Acta Metall. 11, 1275 (1963).Google Scholar
6. Xu, J., Yu, L., Azuma, Y., Fujimoto, T., Umehara, H., and Kojima, I., Appl. Phys. Lett. 81, 4139 (2002).Google Scholar