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HRTEM and EELS Studies of GdSi2 Nanostructures Grown by Self-Assembly

Published online by Cambridge University Press:  26 February 2011

Jiaming Zhang
Affiliation:
zhangj16@msu.edu, Michigan State Univ., Chemical Eng. & Materials Sci., 2527 Engineering Bld, East lansing, MI, 48824, United States
Gangfeng Ye
Affiliation:
yegangfe@msu.edu, Michigan State University, Department of Chemical Engineering and Materials Science, United States
R. Loloee
Affiliation:
loloee@msu.edu, Michigan State University, Department of Physics and Astronomy, United States
Martin A. Crimp
Affiliation:
crimp@egr.msu.edu, Michigan State University, Department of Chemical Engineering and Materials Science, United States
Jun Nogami
Affiliation:
jun.nogami@utoronto.ca, Univeristy of Toronto, Department of Materials Science and Engineering, Canada
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Abstract

There has been considerable interest in the properties of rare earth metal nanostructures grown epitaxially on Si(001) surfaces. The questions arises as to what extent the nanometer scale lateral dimensions (width and thickness) affect the material properties. We compare thin film Gd silicide samples with Gd nanostructures grown on Si(001) using high resolution transmission electron microscopy (HRTEM). The nanostructures have the same orthorhombic crystal structure as the thicker silicide films. Electron energy loss spectroscopy measurements from metallic Gd and the thin film silicides are also shown as references for similar measurements on the nanostructures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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