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Implantation of 1.5 MeV Ag+ Ions in Silica Glass

Published online by Cambridge University Press:  26 February 2011

K. Fukumi ,
A. Chayahara ,
J. Hayakawa  and
M. Satou
K. Fukumi
Affiliation:
Government Industrial Research Institute, Osaka, 1-8-31, Midorigaoka, Ikeda, Osaka 563, Japan
A. Chayahara
Affiliation:
Government Industrial Research Institute, Osaka, 1-8-31, Midorigaoka, Ikeda, Osaka 563, Japan
J. Hayakawa
Affiliation:
Government Industrial Research Institute, Osaka, 1-8-31, Midorigaoka, Ikeda, Osaka 563, Japan
M. Satou
Affiliation:
Government Industrial Research Institute, Osaka, 1-8-31, Midorigaoka, Ikeda, Osaka 563, Japan
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Abstract

Ag+ ions were implanted in silica glass at an acceleration energy of 1.5MeV. It is found that Ag atoms are present in both the metallic and ionic states. Ag atoms in the metallic state increase when the Ag atom concentration increases. It is shown that the structure of damaged glass recovers monotonically from the surface to the inside of the glass. The state of the Ag atoms does not depend on the glass structure damaged by ion implantation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 201: Symposium A – Surface Chemistry and Beam-Solid Interactions , 1990 , 241
Copyright
Copyright © Materials Research Society 1991

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