Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-23T23:31:28.097Z Has data issue: false hasContentIssue false
  • English
  • Français

Low-Dielectric Constant Film Formation By Plasma Fluorination Of Hydrocarbon Polymers

Published online by Cambridge University Press:  15 February 2011

Hiroshi Kudo ,
Rika Shinohara  and
Masao Yamada
Hiroshi Kudo
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Rika Shinohara
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Masao Yamada
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Get access

Abstract

We have investigated plasma fluorination of hydrocarbon polymer films spincoated onto silicon wafers. Fluorinated hydrocarbon polymers gave low dielectric constants of 2.0 – 2.4 which was close to that of PTFE. However, the thermal stability of these fluorinated polymers inferior to that of the non-fluorinated polymers. We believe that this is due to a decrease in the molecular weight resulting from C-C bond cleavage. We think that such a side reaction will be controlled by removing residual oxygen in a fluorination chamber. The molecular structures of the fluorinated polymers were analyzed by X-ray photo emission spectroscopy. Finally, we proposed direct patterning of interlayer dielectrics using plasma fluorination.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 381: Symposium F – Low-Dielectric Constant Materials--Synthesis and Applications in Micro. , 1995 , 105
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Kakumu, M. and Igawa, S.: Nikkei Micro devices. (1989) No.8,81 [in Japanese].Google Scholar
[2] Denton, D. D., Day, D. R., Priore, D. F., Senturia, S. D., Anolick, E. S. and Scheider, D.: J. of Elec. Mat. 14(1985) 119.Google Scholar
[3] Larsen, R. A.: IMB J. Res. Develop. 24(1980)268.Google Scholar
[4] Moss, S. J., Jolly, A. M. and Tighe, B. J.: Plasma Chemistry and Plasma Processing. 6 (1986) No.4,401.Google Scholar
[5] Nakajima, K., Bell, A.T. and Shen, M.: J. Appl. Polym. Sci. 23 (1979)2627.Google Scholar
[6] Clark, D. T. and Ivin, K. J.: Structural studies of macromolecules by spectroscopic method (Wiley, New York, 1976).Google Scholar