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Metal Organic Deposition of REBa2Cu3O7-y Films from Metal Trifluoroacetate Precursors
Published online by Cambridge University Press: 18 March 2011
Abstract
Metal organic deposition (MOD) process using metal trifluoroacetate (TFA) precursors was applied to the Nd1+XBa2−XCu3Oy (Nd123) and the Tc dependence on experimental conditions such as the oxygen partial pressure (PO2) and the substrate temperature (Ts) for annealing was investigated. Thin films grown on SrTiO3 substrates at Ts = 800°C under PO2 = 300 ppm showed a Tc value of 89 K. However, from the results of TEM-EDS measurements, the substitution values of x in the Nd123 films increased from the substrate toward the surface in the film. These experimental results could be thermodynamically explained by the following model. The basic idea of the model is that the Ba potential in the precursor decreases by coarsening of BaF2 particles during the annealing for the Nd123 crystal growth. This model predicts that the small substitution value can be obtained with a higher growth rate of the Nd123 phase under low PO2.
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- Copyright © Materials Research Society 2001
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