Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-25T19:53:39.321Z Has data issue: false hasContentIssue false
  • English
  • Français

Morphology and Texture of Chemical-Vapour-Deposited TiN Films

Published online by Cambridge University Press:  10 February 2011

Noboru Yoshikawa ,
Shoji Taniguchi  and
Atsushi Kikuchi
Noboru Yoshikawa
Affiliation:
Department of Metallurgy, Faculty of Engineering, Tohoku University, Aramaki aza-Aoba, Aoba-ku, Sendai Japan 98077, yoshin@material.tohoku.ac.jp
Shoji Taniguchi
Affiliation:
Department of Metallurgy, Faculty of Engineering, Tohoku University, Aramaki aza-Aoba, Aoba-ku, Sendai Japan 98077, yoshin@material.tohoku.ac.jp
Atsushi Kikuchi
Affiliation:
Department of Metallurgy, Faculty of Engineering, Tohoku University, Aramaki aza-Aoba, Aoba-ku, Sendai Japan 98077, yoshin@material.tohoku.ac.jp
Get access

Abstract

TiN films were obtained by Chemical Vapour Depositon (CVD) under different deposition conditions. Their grain structure, morphology and preferred crystal orientation were investigated. It was observed that well-defined columnar grams developed under conditions of atmospheric thermal CVD, giving rise to strong preferred orientations. In this study, grain structures of CVD-TiN films were classified with respect to the substrate temperature. Films of zone I structure were obtained at 1173K (0.35Tm), and those of zone II were obtained at 1223K (0.38Tm). Crystal shape of the zone II columnar grains was influenced by the partial pressure of TiCl4 (PTiCl4), and the crystal orientation of films was related to the crystal shapes. Columnar grains increased their thickness during deposition process under conditions of low PTiC14 and high temperature (>1250K). The increase rate of grain size had a similar time dependence to that of normal grain growth. The “quadrangular-shaped” and “star-shaped” columnar crystals were formed. They consisted of several crystals and contained twins. Their microstructures were observed in relation to their crystallographic features.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 472: Symposium I – Polycrystalline Thin Films - Structure, Texture, Properties..III , 1997 , 221
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1, Yokoyama, N., Hinode, K. and Homma, Y.: J. Electrochem. Soc, 136 (1989) 882.Google Scholar
2, Kramer, B.M. and Judd, P.K.: J. Vac. Sci. Tchnol. A3 (1985) 2439.Google Scholar
3, Franclin, S.E. : Surface Engineering Practice edited by Strafford, K.N., Datta, P.K. and Gray, J.S., Horwood, (1990) 60.Google Scholar
4, Blocher, J.M. Jr: J. Vac. Sci. Technol. 11 (1974) 680.Google Scholar
5, Movchan, B.A. and Demchisin, A.V.: Fiz. Metal. Metalloved., 28(1969), 653.Google Scholar
6, Srolovitz, D.J.: J. Vac. Sci. Technol. A4 (1986), 2925.Google Scholar
7, Ling, S. and Anderson, M.P.: Microstructural Science for Thin Film Metallization in Elecronic Applications edited by Sanchez, J., Smith, D.A. and DeLanerolle, N., TMS(1988)99.Google Scholar
8, Smith, D.A. and Ibraham, A.: Mater. Res. Sci. Symp. Proc. 317 (1994), 401.Google Scholar
9, Wahl, G.: Chemical Vapour Deposition, Principles and Applications edited by Hitchman, M.L. and Jensen, K.F., Academic Press (1993),591 Google Scholar
10, Thornton, J.A.: Ann. Rev. Mater. Sci., 7 (1977), 239.Google Scholar
11, Gokoglu, S.A.: Mater. Res. Sci. Symp. Proc. 250 (1992), 17.Google Scholar
12, Van den Breckel, C.H.J. and Jansen, A.K.:J. Cryst. Growth, 43 (1978), 488 Google Scholar
13, Hartmann, H., Hildisch, L., Krause, E. and Mohling, W.: J. Mater. Sci. 26 (1991), 4917.Google Scholar
14, Hedge, R.I., Fiordalice, R.E.R.W., Travis, E.O. and Tobin, P.J.: Mater. Res. Symp. Proc. 250 (1992) 199.Google Scholar
15, Yoshikawa, N. and Kikuchi, A.: J. Mater. Res., 10 (1995) 2801.Google Scholar
16, Yoshikawa, N. and Kikuchi, A.: J. Cryst. Growth 130 (1993) 578.Google Scholar
17, Yoshikawa, N. and Kikuchi, A.: Mater. Sci. Forum, 204–206 (1996) 509.Google Scholar
18, Cheng, H-E. and Hon, M.H.: J. Cryst. Growth 142 (1944) 117.Google Scholar