Hostname: page-component-848d4c4894-xm8r8 Total loading time: 0 Render date: 2024-07-05T03:25:39.575Z Has data issue: false hasContentIssue false

MOVPE Growth of High Electron Mobility AlGaN/GaN Heterostructures

Published online by Cambridge University Press:  21 February 2011

J.M. Redwing
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810
J.S. Flynn
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810
M.A. Tischler
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810
W. Mitchel
Affiliation:
Electronic and Optical Materials Branch, Wright-Patterson AFB, OH
A. Saxler
Affiliation:
Electronic and Optical Materials Branch, Wright-Patterson AFB, OH
Get access

Abstract

We have fabricated AlxGa1−xN/GaN heterostructures with high two-dimensional electron gas (2DEG) mobilities and high sheet carrier densities by metalorganic vapor phase epitaxy (MOVPE). The 2DEG sheet density and mobility exhibit a compositional dependence on the Al fraction of the electron donor layer. The highest mobility (5750 cm2/Vs at 16K) was measured in a sample with x=0.15 that had a sheet carrier density of 8.5×1012 cm−2. The undoped AlxGa1−xN layers have low background carrier concentrations and can be intentionally doped n-type using SiH4. The effect of intentional n-type doping of the AlxGa1−xN donor layer on the electrical properties of the 2DEG was studied in structures that included an undoped AlxGa1−xN spacer layer of varying thickness. Higher 2DEG mobilities were obtained when a 100Å thick undoped layer was included in the structure due to spatial separation of the 2DEG from ionized impurities in the doped AlxGa1−xN. These initial results demonstrate that the electrical properties of AlxGa1−xN/GaN heterostructures can be controlled by intentional doping and appropriate layer design.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Shur, M.S., Khan, A., Gelmont, B., Trew, R.J. and Shin, M.W., Inst. Phys. Conf. Ser. 141, p. 419 (1995).Google Scholar
2 Khan, M.A., Kuznia, J.N., Van Hove, J.M., Pan, N. and Carter, J., Appl. Phys. Lett 60, p. 3027 (1992).Google Scholar
3 Khan, M. A., Bhattarai, A., Kuznia, J.N. and Olson, D.T., Appl. Phys. Lett. 63, p. 1214 (1993).Google Scholar
4 Khan, M. A., Kuznia, J.N., Olson, D.T., Schaff, W.J., Burm, J.W. and Shur, M.S., Appl. Phys. Lett. 65, p. 1121 (1994).Google Scholar
5 Binari, S.C., Rowland, L. B., Kelner, G., Kurppa, W., Dietrich, H.B., Doverspike, K. and Gaskill, D.K., Inst. Phys. Conf. Ser. 141, p. 459 (1995).Google Scholar
6 Khan, M.A., Van Hove, J.M., Kuznia, J.N. and Olson, D.T., Appl. Phys. Lett. 58, p. 2408 (1991).Google Scholar
7 Khan, M. A., Chen, Q., Sun, C.J., Shur, M. and Gelmont, B., Appl. Phys. Lett. 67, p. 1429 (1995).Google Scholar
8 Zhang, X., Kung, P., Saxler, A., Walker, D., Wang, T.C. and Razeghi, M., Appl. Phys. Lett. 67, p. 1745 (1995).Google Scholar