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Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry

Published online by Cambridge University Press:  22 February 2011

C. J. G. Kubiak ,
C. R. Aita ,
F. S. Hickernell  and
S. J. Joseph
C. J. G. Kubiak
Affiliation:
Materials Department and the Labortory for Surface Studies University of Wisconsin-Milwaukee P.O. Box 784, Milwaukee, Wisconsin 53201
C. R. Aita
Affiliation:
Materials Department and the Labortory for Surface Studies University of Wisconsin-Milwaukee P.O. Box 784, Milwaukee, Wisconsin 53201
F. S. Hickernell
Affiliation:
Motorola, Inc. Scottsdale, Arizona 85252
S. J. Joseph
Affiliation:
Motorola, Inc. Scottsdale, Arizona 85252
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Abstract

Films which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 47: Symposium C – Thin Films: The Relationship of Structure to Properties , 1985 , 75
Copyright
Copyright © Materials Research Society 1985

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References

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