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Optical, Structural and Electrical Characteristics of Explosively Crystallized Si Thin Films on Glass Substrates
Published online by Cambridge University Press: 15 February 2011
Abstract
Explosive Crystallization occurs in cw laser annealing on a-Si films deposited on glass substrates at laser scan speeds higher than 30 cm/sec. Optical, structural and electrical properties of the crystallized films at various laser scan speeds confirm the existence of two kinds of explosive growth depending on the state of crystallinity of the starting material.
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- Copyright © Materials Research Society 1982
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