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Opto-electronic properties of co-deposited mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films

Published online by Cambridge University Press:  27 June 2011

James Kakalios ,
U. Kortshagen ,
C. Blackwell ,
C. Anderson ,
Y. Adjallah ,
L. R. Wienkes ,
K. Bodurtha  and
J. Trask
James Kakalios
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
U. Kortshagen
Affiliation:
Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455
C. Blackwell
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
C. Anderson
Affiliation:
Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455
Y. Adjallah
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
L. R. Wienkes
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
K. Bodurtha
Affiliation:
School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455
J. Trask
Affiliation:
Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455
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Abstract

Mixed-phase thin film materials, consisting of nanocrystalline semiconductors embedded within a bulk semiconductor or insulator, have been synthesized in a dual-chamber co-deposition system. A flow-through plasma reactor is employed to generate nanocrystalline particles, that are then injected into a second, capacitively-coupled plasma deposition system in which the surrounding semiconductor or insulating material is deposited. Raman spectroscopy, X-ray diffraction and high resolution TEM confirm the presence of nanocrystals homogenously embedded throughout the a-Si:H matrix. In undoped nc-Si within a-Si:H (a/nc-Si:H), the dark conductivity increases with crystal fraction, with the largest enhancement of several orders of magnitude observed when the nanocrystalline density corresponds to a crystalline fraction of 2 – 4%. These results are consistent with the nc donating electrons to the surrounding a-Si:H matrix without a corresponding increase in dangling bond density for these films. In contrast, charge transport in n-type doped a/nc-Si:H films is consistent with multi-phonon hopping, possibly through extended nanocrystallite clusters with weak electron-phonon coupling. The flexibility of the dual-chamber co-deposition process is demonstrated by the synthesis of mixed-phase thin films comprised of two distinct chemical species, such as germanium nanocrystallites embedded in a-Si:H and Si nanocrystallites embedded within an insulating a-SiNx:H film.

Keywords

amorphousnanostructureoptoelectronic
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1321: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology , 2011 , mrss11-1321-a12-01
Copyright
Copyright © Materials Research Society 2011

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