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Oxide Formation on NbAl3, and TiAl Due to Ion Implantation of 18O

Published online by Cambridge University Press:  22 February 2011

Robert J. Hanrahan Jr. ,
Ellis D. Verink Jr. ,
Stephen P. Withrow  and
Eero O. Ristolainen
Robert J. Hanrahan Jr.
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
Ellis D. Verink Jr.
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
Stephen P. Withrow
Affiliation:
Oak Ridge National Laboratory, Oak Ridge TN 37831-6048
Eero O. Ristolainen
Affiliation:
Helsinki University of Technology, Espoo, Finland.
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Abstract

Surface modification by ion implantation of 18O ions was investigated as a technique for altering the high-temperature oxidation of aluminide intermetallic compounds and related alloys. Specimens of NbAl3 and TiAl were implanted to a dose of 1×1018 ions/cm2 at 168 keV. Doses and accelerating energies were calculated to obtain near-stoichiometric concentrations of oxygen. Use of 18O allowed the implanted oxygen profiles to be measured using secondary ion mass spectroscopy (SIMS). The near surface oxides formed were studied using x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. Specimens were also examined using x-ray diffraction and SEM. This paper presents results for specimens examined in the as-implanted state. The oxide formed due to implantation is a layer containing a mixture of Nb or Ti and amorphous Al oxides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 783
Copyright
Copyright © Materials Research Society 1994

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References

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